SCHEMBL6549477

SCHEMBL6549477

CC(C)C(=O)C[S+](C)C.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 10/20 0.38
MMP2 P08253 10/20 0.38
MMP9 P14780 10/20 0.38
MMP8 P22894 10/20 0.38
MMP13 P45452 10/20 0.38
CA2 P00918 9/20 0.38
CA1 P00915 8/20 0.38
F2 P00734 2/20 0.32
PRSS1 P07477 2/20 0.32
PRSS2 P07478 2/20 0.32
PRSS3 P35030 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6548702 0.98 MMP1 (0.37) MMP1MMP2MMP9MMP8MMP13
SCHEMBL6549904 0.88 MMP1 (0.38) MMP1MMP2MMP9MMP8MMP13
SCHEMBL6551062 0.88 MMP1 (0.38) MMP1MMP2MMP9MMP8MMP13
SCHEMBL6550676 0.87 CA2 (0.35) MMP1MMP2MMP9MMP8MMP13
SCHEMBL6548790 0.86 CA2 (0.36) MMP1MMP2MMP9MMP8MMP13
SCHEMBL6549209 0.86 CA1 (0.35) MMP1MMP2MMP9MMP8MMP13
SCHEMBL2920103 0.84 CA2 (0.42) MMP1MMP2MMP9MMP8MMP13
SCHEMBL6549694 0.84 MMP1 (0.35) MMP1MMP2MMP9MMP8MMP13
SCHEMBL6548779 0.83 CA2 (0.41) MMP1MMP2MMP9MMP8MMP13
SCHEMBL2918199 0.83 CA2 (0.40) MMP1MMP2MMP9MMP8MMP13

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed