SCHEMBL6549481

SCHEMBL6549481

CCCCCC(=O)C[S+](C)C(C)(C)C.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
FAAH O00519 8/20 0.33
CES1 P23141 6/20 0.32
CES2 O00748 3/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
MMP1 P03956 1/20 0.32
MMP2 P08253 1/20 0.32
MMP9 P14780 1/20 0.32
MMP8 P22894 1/20 0.32
MMP13 P45452 1/20 0.32
MEN1 O00255 1/20 0.32
CYP1A2 P05177 1/20 0.32
KMT2A Q03164 1/20 0.32
HSD17B10 Q99714 1/20 0.32
HAO1 Q9UJM8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550429 0.99 CES1 (0.34) FAAHCES1CES2CA1CA2
SCHEMBL6550981 0.99 FAAH (0.33) FAAHCES1CES2CA1CA2
SCHEMBL6551061 0.98 FAAH (0.35) FAAHCES1CES2MEN1CYP1A2
SCHEMBL6551076 0.96 CA1 (0.33) CA1CA2MMP1MMP2MMP9
SCHEMBL6549548 0.95 CA1 (0.31) CA1CA2MMP1MMP2MMP9
SCHEMBL6550690 0.91 CA1 (0.34) CA1CA2MMP1MMP2MMP9
SCHEMBL6550632 0.90 CA1 (0.33) CA1CA2MMP1MMP2MMP9
SCHEMBL6549763 0.89 FAAH (0.35) FAAHCES1CES2CA1CA2
SCHEMBL6551322 0.88 FAAH (0.36) FAAHCES1CES2CA1CA2
SCHEMBL6551516 0.87 FAAH (0.36) FAAHCES1CES2CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed