SCHEMBL6550429

SCHEMBL6550429

CCCCCCC(=O)C[S+](C)C(C)(C)C.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CES1 P23141 10/20 0.34
FAAH O00519 9/20 0.34
CES2 O00748 6/20 0.34
KMT2A Q03164 2/20 0.34
MEN1 O00255 1/20 0.34
CYP1A2 P05177 1/20 0.34
HSD17B10 Q99714 1/20 0.34
HAO1 Q9UJM8 1/20 0.33
MAPT P10636 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP9 P14780 1/20 0.31
MMP8 P22894 1/20 0.31
MMP13 P45452 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549481 0.99 FAAH (0.33) CES1FAAHCES2KMT2AMEN1
SCHEMBL6551061 0.99 FAAH (0.35) CES1FAAHCES2KMT2AMEN1
SCHEMBL6550981 0.98 FAAH (0.33) CES1FAAHCES2KMT2AMEN1
SCHEMBL6551076 0.95 CA1 (0.33) CA1CA2MMP1MMP2MMP9
SCHEMBL6549548 0.94 CA1 (0.31) CA1CA2MMP1MMP2MMP9
SCHEMBL6550690 0.90 CA1 (0.34) CA1CA2MMP1MMP2MMP9
SCHEMBL6551322 0.89 FAAH (0.36) CES1FAAHCES2KMT2AMEN1
SCHEMBL6550632 0.89 CA1 (0.33) CA1CA2MMP1MMP2MMP9
SCHEMBL6549763 0.88 FAAH (0.35) CES1FAAHCES2KMT2AMEN1
SCHEMBL6550899 0.88 FAAH (0.37) CES1FAAHCES2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed