SCHEMBL6549588

SCHEMBL6549588

CCCCC(=O)CS(CC)(CC)OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
F2 P00734 2/20 0.32
PRSS1 P07477 2/20 0.32
PRSS2 P07478 2/20 0.32
PRSS3 P35030 2/20 0.32
CA2 P00918 4/20 0.32
CA1 P00915 3/20 0.32
MMP1 P03956 2/20 0.32
MMP2 P08253 2/20 0.32
MMP9 P14780 2/20 0.32
MMP8 P22894 2/20 0.32
MMP13 P45452 2/20 0.32
FAAH O00519 3/20 0.31
CES2 O00748 2/20 0.31
CES1 P23141 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549668 0.99 FAAH (0.31) F2PRSS1PRSS2PRSS3CA2
SCHEMBL6549410 0.96 FAAH (0.35) F2PRSS1PRSS2PRSS3CA2
SCHEMBL6551490 0.95 FAAH (0.36) FAAHCES2CES1
SCHEMBL6550702 0.95 FAAH (0.36) FAAHCES2CES1
SCHEMBL6550880 0.93 FAAH (0.37) FAAHCES2CES1
SCHEMBL6549731 0.92 FAAH (0.32) F2PRSS1PRSS2PRSS3CA2
SCHEMBL6549968 0.92 CA2 (0.33) F2PRSS1PRSS2PRSS3CA2
SCHEMBL6549545 0.91 CES1 (0.33) FAAHCES2CES1
SCHEMBL6550499 0.90 CA1 (0.32) F2PRSS1PRSS2PRSS3CA2
SCHEMBL6551072 0.88 FAAH (0.34) F2PRSS1PRSS2PRSS3FAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed