SCHEMBL6549767

SCHEMBL6549767

CCCCCC(=O)CS(C)(C)OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FAAH O00519 11/20 0.35
CES1 P23141 6/20 0.34
CES2 O00748 4/20 0.34
KMT2A Q03164 2/20 0.34
MEN1 O00255 1/20 0.34
CYP1A2 P05177 1/20 0.34
HSD17B10 Q99714 1/20 0.34
MAPT P10636 1/20 0.32
F2 P00734 1/20 0.31
PRSS1 P07477 1/20 0.31
PRSS2 P07478 1/20 0.31
PRSS3 P35030 1/20 0.31
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP9 P14780 1/20 0.31
MMP8 P22894 1/20 0.31
MMP13 P45452 1/20 0.31
DGKA P23743 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6551327 0.99 FAAH (0.36) FAAHCES1CES2KMT2AMEN1
SCHEMBL6551521 0.99 FAAH (0.36) FAAHCES1CES2KMT2AMEN1
SCHEMBL6550900 0.97 FAAH (0.37) FAAHCES1CES2KMT2AMEN1
SCHEMBL6549695 0.96 F2 (0.32) FAAHCES1CES2F2PRSS1
SCHEMBL6549605 0.95 FAAH (0.31) FAAHCES1CES2F2PRSS1
SCHEMBL6551114 0.91 CA2 (0.33) F2PRSS1PRSS2PRSS3CA1
SCHEMBL6550834 0.89 CA1 (0.32) F2PRSS1PRSS2PRSS3CA1
SCHEMBL6549410 0.87 FAAH (0.35) FAAHCES1CES2KMT2AMEN1
SCHEMBL6551490 0.86 FAAH (0.36) FAAHCES1CES2KMT2AMEN1
SCHEMBL6550702 0.85 FAAH (0.36) FAAHCES1CES2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed