Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 6/20 | 0.76 |
| ▸ | NPC1 | O15118 | 5/20 | 0.76 |
| ▸ | LMNA | P02545 | 4/20 | 0.76 |
| ▸ | MAPT | P10636 | 4/20 | 0.76 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.76 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.76 |
| ▸ | HPGD | P15428 | 3/20 | 0.76 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.76 |
| ▸ | MEN1 | O00255 | 5/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.56 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.56 |
| ▸ | CASP1 | P29466 | 1/20 | 0.47 |
| ▸ | CASP7 | P55210 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | PARP1 | P09874 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29724705 | 1.00 | RAB9A (0.76) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| SCHEMBL123584 | 0.93 | RAB9A (0.78) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| SCHEMBL29372630 | 0.93 | RAB9A (0.78) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| SCHEMBL2522633 | 0.93 | MAPT (0.64) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| SCHEMBL19307752 | 0.92 | RAB9A (0.71) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| Hydrochloric Acid SCHEMBL17417855 | 0.90 | RAB9A (0.75) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| Hydrochloric Acid SCHEMBL30705049 | 0.90 | RAB9A (0.75) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| Hydrochloric Acid SCHEMBL11672960 | 0.90 | RAB9A (0.75) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| Hydrochloric Acid SCHEMBL867181 | 0.90 | RAB9A (0.75) | RAB9ANPC1LMNAMAPTALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL3418096 | 0.90 | RAB9A (0.75) | RAB9ANPC1LMNAMAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4646733-A1 | DIELECTRIC FILM FORMING COMPOSITION CONTAINING ACYL GERMANIUM COMPOUND | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2025-11-12 | — | — | EP | disclosed |
| US-20250285785-A1 | DRY FILM | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-09-11 | — | — | US | disclosed |
| WO-2025128307-A1 | POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| US-20250188311-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250188223-A1 | POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250189892-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250188312-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250065365-A1 | DIELECTRIC FILM-FORMING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-02-27 | — | — | US | disclosed |
| US-20250051532-A1 | DIELECTRIC FILM-FORMING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-02-13 | — | — | US | disclosed |
| WO-2025029552-A2 | MICROELECTRONIC DEVICES WITH GOOD RELIABILITY AND RELATED COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-02-06 | — | — | WO | disclosed |
| US-8009266-B2 | Process for producing liquid crystal display | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| US-20100159201-A1 | ELECTRODE PATTERNING LAYER COMPRISING POLYAMIC ACID OR POLYIMIDE AND ELECTRONIC DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100060844-A1 | PROCESS FOR PRODUCING LIQUID CRYSTAL DISPLAY | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100053525-A1 | LIQUID CRYSTAL DISPLAY | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| CN-101535882-A | Method for manufacturing liquid crystal display element | DAINIPPON PRINTING CO LTD (JP) | 2009-09-16 | — | — | CN | disclosed |
| EP-2093610-A1 | PROCESS FOR PRODUCING LIQUID CRYSTAL DISPLAY ELEMENT | Dai Nippon Printing Co., Ltd. (JP) | 2009-08-26 | — | — | EP | disclosed |
| US-7537812-B2 | Aligning agent for liquid crystal and liquid-crystal alignment film obtained with the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| EP-1898451-A1 | ELECTRODE PATTERNING LAYER COMPRISING POLYAMIC ACID OR POLYIMIDE AND ELECTRONIC DEVICE USING THE SAME | Nissan Chemical Industries, Ltd. (JP) | 2008-03-12 | — | — | EP | disclosed |
| US-20070036915-A1 | Comprising at least one polymer selected from a polyamic acid and a soluble polyimide, diethylene glycol diethyl ether, and dipropylene glycol monomethyl ether; good coating film uniformity even when the drying temperature changes during formation of the coating film | MARIKO KUROSAKI ET AL | 2007-02-15 | — | — | US | disclosed |
| US-5393612-A | Conductor and insulating coating having tensile strength of at least 13 kg/mm2 | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 1995-02-28 | — | — | US | disclosed |