Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG | P37231 | 6/20 | 0.38 |
| ▸ | PPARA | Q07869 | 6/20 | 0.38 |
| ▸ | PRKCA | P17252 | 1/20 | 0.34 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | GSK3B | P49841 | 3/20 | 0.32 |
| ▸ | BACE1 | P56817 | 3/20 | 0.32 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | SLC5A1 | P13866 | 1/20 | 0.31 |
| ▸ | SLC5A2 | P31639 | 1/20 | 0.31 |
| ▸ | MAOB | P27338 | 1/20 | 0.31 |
| ▸ | LCK | P06239 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6775509 | 0.81 | PPARG (0.42) | PPARGPPARANPC1RAB9ASMN1; SMN2 | |
| SCHEMBL6279443 | 0.78 | CYP1A2 (0.51) | PPARGPPARANPC1RAB9ASMN1; SMN2 | |
| SCHEMBL6550374 | 0.76 | ABCB11 (0.33) | ALDH1A1LTB4RLTB4R2 | |
| SCHEMBL6279349 | 0.73 | BCHE (0.35) | LTB4RLTB4R2 | |
| SCHEMBL7264942 | 0.72 | PPARA (0.43) | PPARGPPARANPC1RAB9ASMN1; SMN2 | |
| SCHEMBL7269880 | 0.72 | HIF1A (0.32) | — | |
| SCHEMBL6777721 | 0.72 | PPARG (0.40) | PPARGPPARANPC1RAB9ASMN1; SMN2 | |
| SCHEMBL6277762 | 0.72 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL6551779 | 0.70 | PPARG (0.44) | PPARGPPARANPC1RAB9ASMN1; SMN2 | |
| SCHEMBL6780612 | 0.70 | PPARG (0.39) | PPARGPPARANPC1RAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0789279-B2 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2004-12-08 | — | — | EP | disclosed |
| EP-0780732-B1 | Polymer composition and resist material | WAKO PURE CHEM IND LTD (JP) | 2003-07-09 | — | — | EP | disclosed |
| US-6303264-B1 | PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-0789279-B1 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6033826-A | POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| EP-0704762-B1 | Resist material and pattern formation | WAKO PURE CHEM IND LTD (JP) | 1999-12-15 | — | — | EP | disclosed |
| US-5976759-A | ALKALI SOLUBLE BY HEATING | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| EP-0875787-A1 | Method for reducing the substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |