Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6551077

CCCCCCC(=O)C[S+]1CCCC1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.39

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Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CES1 P23141 8/20 0.39
FAAH O00519 7/20 0.39
CES2 O00748 5/20 0.39
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
CYP1A2 P05177 1/20 0.39
HSD17B10 Q99714 1/20 0.39
KCNH2 Q12809 6/20 0.37
HAO1 Q9UJM8 1/20 0.37
MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6550569 0.99 CES1 (0.38) CES1FAAHCES2KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL6549419 0.99 FAAH (0.38) CES1FAAHCES2KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL6550326 0.97 FAAH (0.37) CES1FAAHCES2KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL6550368 0.94 CES1 (0.33) CES1FAAHCES2KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL6550468 0.93 KCNH2 (0.33) CES1FAAHCES2KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL6548773 0.88
Trifluoromethanesulfonic Acid SCHEMBL6728421 0.88 FAAH (0.36) CES1FAAHCES2KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL6723507 0.88 CES1 (0.36) CES1FAAHCES2KMT2AMEN1
SCHEMBL6549350 0.87 CES1 (0.34) CES1FAAHCES2KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL6549348 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed