SCHEMBL6550391

SCHEMBL6550391

CCCCCC(=O)C[S+](CCCC)CCCC.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
FAAH O00519 8/20 0.34
CES1 P23141 9/20 0.33
CES2 O00748 6/20 0.33
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.33
CYP1A2 P05177 1/20 0.33
HSD17B10 Q99714 1/20 0.33
HAO1 Q9UJM8 1/20 0.32
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
MMP1 P03956 2/20 0.31
MMP2 P08253 2/20 0.31
MMP9 P14780 2/20 0.31
MMP8 P22894 2/20 0.31
MMP13 P45452 2/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550555 0.99 FAAH (0.36) FAAHCES1CES2KMT2AMEN1
SCHEMBL6551065 0.99 FAAH (0.33) FAAHCES1CES2KMT2AMEN1
SCHEMBL6548901 0.97 CES1 (0.35) FAAHCES1CES2KMT2AMEN1
SCHEMBL6549537 0.96 CA1 (0.32) CES1CES2CA1CA2MMP1
SCHEMBL6549728 0.95 CA1 (0.33) CA1CA2MMP1MMP2MMP9
SCHEMBL6548944 0.94 CA1 (0.32) CA1CA2MMP1MMP2MMP9
SCHEMBL6548844 0.92 CA1 (0.33) CA1CA2MMP1MMP2MMP9
SCHEMBL2912608 0.92 CA1 (0.34) CA1CA2MMP1MMP2MMP9
SCHEMBL6550698 0.91 FAAH (0.35) FAAHCES1CES2KMT2AMEN1
SCHEMBL2924285 0.91 CA2 (0.36) CA1CA2MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed