Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6550634

CCCCCC(=O)C[S+](C)C1CCCCC1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.37

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Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.36
FAAH O00519 8/20 0.33
CES1 P23141 5/20 0.33
CES2 O00748 2/20 0.33
MEN1 O00255 1/20 0.33
CYP1A2 P05177 1/20 0.33
KMT2A Q03164 1/20 0.33
HSD17B10 Q99714 1/20 0.33
KCNH2 Q12809 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6551170 0.99 NAAA (0.38) NAAAFAAHCES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6549464 0.96 NAAA (0.31) NAAAMEN1KMT2AKCNH2
Trifluoromethanesulfonic Acid SCHEMBL6551194 0.91
SCHEMBL6551158 0.89 NAAA (0.32) NAAA
SCHEMBL6550798 0.88 NAAA (0.32) NAAA
SCHEMBL6550420 0.88 NAAA (0.34) NAAAFAAHCES1CES2MEN1
SCHEMBL6551419 0.87 NAAA (0.33) NAAAFAAHCES1CES2MEN1
SCHEMBL6734934 0.87 NAAA (0.45) NAAACES1CES2MEN1KMT2A
SCHEMBL6549426 0.86 NAAA (0.37) NAAACES1CES2MEN1KMT2A
Trifluoromethanesulfonic Acid SCHEMBL6549524 0.85

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed