Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6551194

CCCC(=O)C[S+](C)C1CCCCC1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6549464 0.92 NAAA (0.31)
Trifluoromethanesulfonic Acid SCHEMBL6550634 0.91 NAAA (0.36)
Trifluoromethanesulfonic Acid SCHEMBL6551170 0.90 NAAA (0.38)
Trifluoromethanesulfonic Acid SCHEMBL6549524 0.89
SCHEMBL6723746 0.88
SCHEMBL6726269 0.87 CA1 (0.30)
SCHEMBL6734047 0.85 NAAA (0.34)
Trifluoromethanesulfonic Acid SCHEMBL6551087 0.83
SCHEMBL6549856 0.83 NAAA (0.32)
SCHEMBL6549886 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed