SCHEMBL6550989

SCHEMBL6550989

CCCCC(=O)CS(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)(C(C)C)C(C)C

nearest known ligand 0.33

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.33
CA2 P00918 3/20 0.33
MMP1 P03956 3/20 0.33
MMP2 P08253 3/20 0.33
MMP9 P14780 3/20 0.33
MMP8 P22894 3/20 0.33
MMP13 P45452 3/20 0.33
FAAH O00519 11/20 0.32
CES1 P23141 6/20 0.32
CES2 O00748 4/20 0.32
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
KMT2A Q03164 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6551179 0.99 CA1 (0.32) CA1CA2MMP1MMP2MMP9
SCHEMBL6550907 0.96 FAAH (0.36) CA1CA2MMP1MMP2MMP9
SCHEMBL6551171 0.95 FAAH (0.38) FAAHCES1CES2MEN1CYP1A2
SCHEMBL6551278 0.95 FAAH (0.36) CA1CA2MMP1MMP2MMP9
SCHEMBL6550844 0.94 FAAH (0.37) FAAHCES1CES2MEN1CYP1A2
SCHEMBL6551046 0.92 CA1 (0.34) CA1CA2MMP1MMP2MMP9
SCHEMBL6549723 0.91 CA1 (0.33) CA1CA2MMP1MMP2MMP9
SCHEMBL6550811 0.87 CA1 (0.35) CA1CA2MMP1MMP2MMP9
SCHEMBL6550479 0.85 CA2 (0.35) CA1CA2MMP1MMP2MMP9
SCHEMBL6549752 0.85 FAAH (0.36) FAAHCES1CES2MEN1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed