⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6554397 | 0.93 | MEN1 (0.38) | — | |
| SCHEMBL3886205 | 0.82 | — | — | |
| SCHEMBL3874885 | 0.82 | — | — | |
| SCHEMBL486112 | 0.82 | — | — | |
| SCHEMBL5979280 | 0.80 | — | — | |
| SCHEMBL8846056 | 0.80 | — | — | |
| SCHEMBL5344482 | 0.80 | — | — | |
| SCHEMBL65810 | 0.80 | — | — | |
| SCHEMBL2739848 | 0.80 | — | — | |
| SCHEMBL7869368 | 0.78 | LMNA (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6737215-B2 | Photoresist composition for deep ultraviolet lithography | CLARIANT FINANCE (BVI) LTD (VG) | 2004-05-18 | — | — | US | claimed |
| EP-1388027-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD. (CH) | 2004-02-11 | — | — | EP | claimed |
| US-6686429-B2 | COPOLYMER OF AN ETHENICALLY UNSATURATED NITRILE-CONTAINING MONOMER AND A NONAROMATIC CYCLIC UNIT SUCH AS TERT-BUTYL NORBORENECARBOXYLATE; SENSITIVE IN DEEP ULTRAVIOLET REGION; MICROLITHOGRAPHY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-02-03 | — | — | US | claimed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | claimed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | claimed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| EP-4371979-A1 | FORMAMIDE DERIVATIVE AND AGRICULTURAL OR HORTICULTURAL PLANT DISEASE CONTROL AGENT | Kumiai Chemical Industry Co., Ltd. (JP) | 2024-05-22 | — | — | EP | disclosed |
| CN-117693500-A | Carboxamide derivative and agricultural/horticultural plant disease control agent | 组合化学工业株式会社 | 2024-03-12 | — | — | CN | disclosed |
| WO-2023286855-A1 | FORMAMIDE DERIVATIVE AND AGRICULTURAL OR HORTICULTURAL PLANT DISEASE CONTROL AGENT | クミアイ化学工業株式会社 | 2023-01-19 | — | — | WO | disclosed |
| EP-1392745-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | Clariant Finance (BVI) Limited (VG) | 2004-03-03 | — | — | EP | disclosed |
| US-6686429-B2 | COPOLYMER OF AN ETHENICALLY UNSATURATED NITRILE-CONTAINING MONOMER AND A NONAROMATIC CYCLIC UNIT SUCH AS TERT-BUTYL NORBORENECARBOXYLATE; SENSITIVE IN DEEP ULTRAVIOLET REGION; MICROLITHOGRAPHY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-02-03 | — | — | US | disclosed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | disclosed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | disclosed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | disclosed |
| US-6372854-B1 | POLYALKENAMERS USED AS PHOTORESISTS HAVING EXCELLENT OPTICAL ELECTRICAL PROPERTIES; HIGH RIGIDITY; HEAT RESISTANCE; ADHESION AND WEAR RESISTANCE; HYDROGENATION; ACIDOLYSIS | MITSUI CHEMICALS, INC. (JP) | 2002-04-16 | — | — | US | disclosed |