⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22905077 | 0.76 | — | — | |
| SCHEMBL880 | 0.76 | — | — | |
| SCHEMBL1331223 | 0.76 | — | — | |
| SCHEMBL879 | 0.76 | — | — | |
| SCHEMBL12689738 | 0.76 | — | — | |
| Water SCHEMBL23042869 | 0.75 | LMNA (0.96) | — | |
| Water SCHEMBL23042868 | 0.75 | LMNA (0.96) | — | |
| SCHEMBL7073445 | 0.74 | — | — | |
| SCHEMBL11407604 | 0.74 | LMNA (0.54) | — | |
| SCHEMBL45972 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1052258-B1 | PROCESS FOR PRODUCING BETA-HYDROXY-GAMMA-BUTYROLACTONE DERIVATIVES AND BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONE DERIVATIVES | MITSUBISHI RAYON CO (JP) | 2004-03-03 | — | — | EP | claimed |
| US-6313321-B1 | Process for preparing β-hydroxy-γ-butyrolactones and β-(meth)acryloyloxy-γ-butrolactones | MITSUBISHI RAYON CO., LTD. (JP) | 2001-11-06 | — | — | US | claimed |
| JP-10212283-A | — | — | None | — | — | JP | disclosed |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11822240-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11754922-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-11754922-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-20130260314-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| EP-2296040-A1 | Positive photosensitive composition | Fujifilm Corporation (JP) | 2011-03-16 | — | — | EP | disclosed |
| EP-1052258-B1 | PROCESS FOR PRODUCING BETA-HYDROXY-GAMMA-BUTYROLACTONE DERIVATIVES AND BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONE DERIVATIVES | MITSUBISHI RAYON CO (JP) | 2004-03-03 | — | — | EP | disclosed |
| US-6313321-B1 | Process for preparing β-hydroxy-γ-butyrolactones and β-(meth)acryloyloxy-γ-butrolactones | MITSUBISHI RAYON CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| US-6313321-B1 | Process for preparing β-hydroxy-γ-butyrolactones and β-(meth)acryloyloxy-γ-butrolactones | MITSUBISHI RAYON CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| EP-1052258-A1 | PROCESS FOR PRODUCING BETA-HYDROXY-GAMMA-BUTYROLACTONE DERIVATIVES AND BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONE DERIVATIVES | Mitsubishi Rayon Co., Ltd. (JP) | 2000-11-15 | — | — | EP | disclosed |
| CN-1043529-C | Carbonylation of epoxides | SHELL INT RESEARCH (NL) | 1999-06-02 | — | — | CN | disclosed |
| JP-H10212283-A | PRODUCTION OF BETA-HYDROXY-GAMMA-BUTYROLACTONES AND BETA-(METH)ACRYOYLOXY-GAMMA-BUTYROLACTONES | MITSUBISHI RAYON CO LTD | 1998-08-11 | — | — | JP | disclosed |
| CN-1082540-A | The carbonylation of epoxy compounds | SHELL INT RESEARCH (NL) | 1994-02-23 | — | — | CN | disclosed |