Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.60 |
| ▸ | TSHR | P16473 | 5/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.43 |
| ▸ | GLA | P06280 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 4/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | PPARG | P37231 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25475881 | 0.87 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL13444950 | 0.86 | ALDH1A1 (0.73) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL6430794 | 0.86 | ALDH1A1 (0.53) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL14231436 | 0.86 | ALDH1A1 (0.53) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL11727544 | 0.86 | ALDH1A1 (0.53) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL15129980 | 0.84 | ALDH1A1 (0.56) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL23248792 | 0.84 | TSHR (0.54) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL17160878 | 0.84 | TSHR (0.60) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL22933097 | 0.83 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL7525291 | 0.83 | ALDH1A1 (0.69) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 901 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024141190-A1 | PHOSPHINE OXIDE-BASED PHOTOINITIATORS | ARKEMA FRANCE (FR) | 2024-07-04 | — | — | WO | claimed |
| US-11965115-B2 | Anti-corrosion coating composition | GLOBAL GRAPHENE GROUP, INC. (US) | 2024-04-23 | — | — | US | claimed |
| US-11945971-B2 | Anti-corrosion material-coated discrete graphene sheets and anti-corrosion coating composition containing same | GLOBAL GRAPHENE GROUP, INC. (US) | 2024-04-02 | — | — | US | claimed |
| CN-112585222-B | Discrete graphene sheet coated with anti-corrosive material and anti-corrosive coating composition comprising discrete graphene sheet | 纳米技术仪器公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116194842-A | Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin | 荣昌化学制品株式会社 | 2023-05-30 | — | — | CN | claimed |
| US-11586109-B2 | Chemically-amplified-type negative-type photoresist composition | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-02-21 | — | — | US | claimed |
| CN-109154776-B | Chemically amplified negative photoresist composition | 荣昌化学制品株式会社 | 2022-06-28 | — | — | CN | claimed |
| US-20220172955-A1 | NOVEL ETCHING PATTERN FORMING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2022-06-02 | — | — | US | claimed |
| EP-3435160-B1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | YOUNG CHANG CHEMICAL CO LTD (KR) | 2022-05-04 | — | — | EP | claimed |
| EP-3940747-A1 | NOVEL ETCHING PATTERN FORMING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS | Young Chang Chemical Co., Ltd. (KR) | 2022-01-19 | — | — | EP | claimed |
| US-9434810-B2 | Shape memory epoxy materials using aromatic alcohol cure agents | SPIRIT AEROSYSTEMS, INC. (US) | 2016-09-06 | — | — | US | claimed |
| US-20160026846-A1 | Flexible fingerprint sensor materials and processes | GLOBAL GRAPHENE GROUP, INC. | 2016-01-28 | — | — | US | claimed |
| US-8916622-B2 | Heat-curable epoxy functional composition and transparent heat-cured caustic-resistant hard-coatings prepared therefrom | Essilor Internatonal (Compagnie Générale d'Optique) (FR) | 2014-12-23 | — | — | US | claimed |
| US-20140343247-A1 | SHAPE MEMORY EPOXY COPOLYMERS USING AROMATIC ALCOHOL CURE AGENTS | SPIRIT AEROSYSTEMS, INC. | 2014-11-20 | — | — | US | claimed |
| US-20140342100-A1 | CURABLE COATING COMPOSITION | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2014-11-20 | — | — | US | claimed |
| EP-2800788-A1 | CURABLE COATING COMPOSITION | Essilor International (Compagnie Générale D'Optique) (FR) | 2014-11-12 | — | — | EP | claimed |
| EP-2513185-B1 | HEAT-CURABLE EPOXY FUNCTIONAL COMPOSITION AND TRANSPARENT HEAT-CURED CAUSTIC-RESISTANT HARD-COATINGS PREPARED THEREFROM | ESSILOR INT (FR) | 2014-04-30 | — | — | EP | claimed |
| WO-2013103334-A1 | CURABLE COATING COMPOSITION | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2013-07-11 | — | — | WO | claimed |
| US-20120327364-A1 | HEAT-CURABLE EPOXY FUNCTIONAL COMPOSITION AND TRANSPARENT HEAT-CURED CAUSTIC-RESISTANT HARD-COATINGS PREPARED THEREFROM | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2012-12-27 | — | — | US | claimed |
| US-7417104-B2 | Porous film-forming composition, patterning process, and porous sacrificial film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-08-26 | — | — | US | claimed |