SCHEMBL6556918

SCHEMBL6556918

O=[N+]([O-])c1n[nH]c2ccc3ccccc3c12

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PIM1 P11309 4/20 0.43
CNR2 P34972 2/20 0.43
HNF4A P41235 3/20 0.42
ALDH1A1 P00352 2/20 0.42
PIM3 Q86V86 2/20 0.42
TSHR P16473 1/20 0.41
MAPT P10636 2/20 0.41
HPGD P15428 1/20 0.41
HPRT1 P00492 1/20 0.41
CNR1 P21554 1/20 0.40
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HSP90AA1 P07900 1/20 0.39
CYP3A4 P08684 2/20 0.39
TYMS P04818 1/20 0.38
LMNA P02545 1/20 0.36
HTT P42858 1/20 0.36
RECQL P46063 1/20 0.36
NPC1 O15118 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL342380 0.76 KDM4E (0.48) CNR2ALDH1A1TSHRMAPTHPGD
SCHEMBL30071547 0.76 KDM4E (0.48) CNR2ALDH1A1TSHRMAPTHPGD
SCHEMBL6556923 0.76 HPRT1 (0.45) PIM1CNR2HNF4AALDH1A1TSHR
Hydrochloric Acid SCHEMBL28220934 0.75 KDM4E (0.47) CNR2ALDH1A1TSHRMAPTHPGD
Naphthalene SCHEMBL28421339 0.74 AR (0.50) PIM1ALDH1A1PIM3TSHRMAPT
SCHEMBL1253994 0.72 NOS1 (0.50) ALDH1A1TSHRMAPTHPGDMEN1
SCHEMBL4971065 0.71 CDK4 (0.40) CNR2ALDH1A1TSHRHPGDHPRT1
SCHEMBL4056717 0.71 AR (0.54) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL14353198 0.71 PDPK1 (0.41) PIM1CNR2ALDH1A1PIM3TSHR
SCHEMBL31504045 0.71 PDPK1 (0.41) PIM1ALDH1A1PIM3TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0774687-B1 Solid processing composition and method for processing silver halide photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 2004-09-15 EP disclosed
EP-1011023-B1 An image forming method of a silver halide photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 2004-03-03 EP disclosed
EP-0777150-B1 Developing composition for silver halide photographic light sensitive material KONISHIROKU PHOTO IND (JP) 2003-09-17 EP disclosed
EP-0823656-B1 Silver halide photographic light sensitive material KONISHIROKU PHOTO IND (JP) 2002-04-10 EP disclosed
US-6361919-B1 PHOTOSENSITIVE MATERIAL KONICA CORPORATION (JP) 2002-03-26 US disclosed
EP-0888812-B1 Solid processing composition for silver halide light sensitive photographic material and preparing method thereof KONISHIROKU PHOTO IND (JP) 2002-03-13 EP disclosed
US-6338941-B1 SILVER HALIDE LIGHT-SENSITIVE BLACK-AND-WHITE PHOTOGRAPHIC MATERIAL COMPRISING SUPPORT AND AT LEAST ONE HYDROPHILIC COLLOID LAYER INCLUDING SILVER HALIDE EMULSION LAYER, WHEREIN HYDROPHILIC COLLOID LAYER COMPRISES SPECIFIED SENSITIZING DYE KONICA CORPORATION (JP) 2002-01-15 US disclosed
EP-1069467-A1 Photographic spectral sensitizing dye, silver halide light sensitive photographic material and image forming method using said material KONICA CORPORATION (JP) 2001-01-17 EP disclosed
US-6153366-A MULTILAYER; SUPPORTS, SILVER HALIDE EMULSION, HYDROPHILIC COLLOID MIXTURE OF POLYMER AND GELATIN KONICA CORPORATION (JP) 2000-11-28 US disclosed
US-6117611-A EXPOSING TO A LASER BEAM LIGHT BEING CONVEYED WITH ROLLERS AT 15-100 MM/SEC.; USING A DEVELOPER HAVING A 1,2-VINYLDIOL GROUP; CONTRAST ENHANCING AGENT; NO BLACKENED PRESSURE MARK CAUSED BY ABRASION; PRINTING AND PLATE-MAKING FIELD KONICA CORPORATION (JP) 2000-09-12 US disclosed
WO-1991009345-A1 SUPER-HIGH CONTRAST SILVER HALIDE MATERIAL INTERNATIONAL PAPER COMPANY (US) 1991-06-27 WO disclosed
US-4997980-A Ethanedioic acid hydrazide compounds suitable for use in high contrast photographic emulsions ANITEC IMAGE CORPORATION (US) 1991-03-05 US disclosed
US-4686167-A FOR HALFTONES ANITEC IMAGE CORPORATION (US) 1987-08-11 US disclosed
EP-0217310-A2 Compounds and composition useful as dot promoting agents INTERNATIONAL PAPER COMPANY (US) 1987-04-08 EP disclosed
US-4078933-A OXONOL DYE FUJI PHOTO FILM CO., LTD. (JA) 1978-03-14 US disclosed
US-4067738-A PYRAZOLONE DYES, OXAZOLINE DYES FUJI PHOTO FILM CO., LTD. 1978-01-10 US disclosed
US-4059448-A SILVER HALIDE, POLY(2-DIETHYLAMINOETHYL METHACRYLATE FUJI PHOTO FILM CO., LTD. (JA) 1977-11-22 US disclosed
US-4028112-A MEROCYANINE DYE WITH OXAZOLE NUCLEUS FUJI PHOTO FILM CO., LTD. (JA) 1977-06-07 US disclosed
US-3989528-A PYRAZOLE DYES FUJI PHOTO FILM CO., LTD. (JA) 1976-11-02 US disclosed
US-3984247-A Dye-containing silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JA) 1976-10-05 US disclosed