SCHEMBL6561401

SCHEMBL6561401

CC(C)(C)O[Si](C#Cc1ccccc1)(C#Cc1ccccc1)OC(C)(C)C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.42
GRM5 P41594 4/20 0.39
NPC1 O15118 3/20 0.39
RAB9A P51151 3/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
CYP1A2 P05177 2/20 0.39
CYP3A4 P08684 2/20 0.39
CYP2C9 P11712 2/20 0.39
CYP2C19 P33261 2/20 0.39
THPO P40225 2/20 0.39
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 1/20 0.39
ALDH1A1 P00352 1/20 0.39
TP53 P04637 1/20 0.39
CYP2D6 P10635 1/20 0.39
PKM P14618 1/20 0.39
HPGD P15428 1/20 0.39
ALOX15 P16050 1/20 0.39
KMT2A Q03164 1/20 0.39
GRIN2B Q13224 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6562535 0.86 APP (0.44) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL6562837 0.84 APP (0.42) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL6562555 0.77 APP (0.48) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL6564255 0.72 APP (0.42) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL6561451 0.72 APP (0.42) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL12680245 0.71 APP (0.46) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL6562433 0.69 APP (0.39) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL6562696 0.69 NPSR1 (0.42) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL563613 0.69 APP (0.55) APPGRM5NPC1RAB9ASMN1; SMN2
SCHEMBL10606190 0.69 APP (0.55) APPGRM5NPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed