Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | G6PD | P11413 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | CCR6 | P51684 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL120101 | 0.81 | TSHR (0.39) | ALDH1A1CYP3A4MAPK1 | |
| SCHEMBL19795780 | 0.78 | ALDH1A1 (0.41) | KDM4EALDH1A1MAPT | |
| Methane SCHEMBL27481300 | 0.77 | CYP3A4 (0.37) | ALDH1A1CYP3A4MAPK1 | |
| SCHEMBL5182505 | 0.77 | CYP3A4 (0.37) | ALDH1A1CYP3A4MAPK1 | |
| Bromide SCHEMBL28157338 | 0.77 | CYP3A4 (0.37) | ALDH1A1CYP3A4MAPK1 | |
| Fluoride SCHEMBL28587768 | 0.77 | CYP3A4 (0.37) | ALDH1A1CYP3A4MAPK1 | |
| Hexamethylbenzene SCHEMBL10345657 | 0.77 | CYP3A4 (0.37) | ALDH1A1CYP3A4MAPK1 | |
| SCHEMBL2724509 | 0.77 | CYP3A4 (0.44) | KDM4EALDH1A1CYP3A4HPGDMAPK1 | |
| SCHEMBL10411849 | 0.77 | CYP3A4 (0.37) | ALDH1A1CYP3A4MAPK1 | |
| SCHEMBL10346431 | 0.77 | CYP3A4 (0.37) | ALDH1A1CYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023090215-A1 | RESIN COMPOSITION, RESIN-ATTACHED FILM, RESIN-ATTACHED METAL FOIL, METAL-CLAD LAMINATE SHEET, AND PRINTED WIRING BOARD | パナソニックＩＰマネジメント株式会社 | 2023-05-25 | — | — | WO | disclosed |
| US-20210229407-A1 | Resin Composition, Prepreg, Metal Foil-Clad Laminate, Resin Sheet, and Printed Wiring Board | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-07-29 | — | — | US | disclosed |
| US-20210214547-A1 | Resin Composition, Prepreg, Metal Foil-Clad Laminate, Resin Sheet, and Printed Wiring Board | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-07-15 | — | — | US | disclosed |
| US-6806019-B2 | COATING SUBSTRATES WITH PHOTORESIST MIXTURES COMPRISING NOVOLAKS, ACRYLIC ESTER COPOLYMERS AND PHOTOSENSITIZERS, THEN EXPOSING THE COATINGS AND DEVELOPING, TO FORM SEMICONDUCTORS OR FLAT PANEL DISPLAYS | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-10-19 | — | — | US | disclosed |
| US-20040170917-A1 | Method of forming thick resist pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2004-09-02 | — | — | US | disclosed |
| EP-1400850-A1 | METHOD OF FORMING THICK RESIST PATTERN | CLARIANT INTERNATIONAL LTD. (CH) | 2004-03-24 | — | — | EP | disclosed |
| EP-1345081-A1 | HIGH-RESOLUTION PHOTOSENSITIVE RESIN COMPOSITION USABLE WITH I-LINE AND METHOD OF FORMING PATTERN | Clariant International Ltd. (CH) | 2003-09-17 | — | — | EP | disclosed |
| US-6537719-B1 | Both a resin and a photosensitive material, wherein a fluorescent material is incorporated | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-25 | — | — | US | disclosed |
| US-20030022093-A1 | High-resolution photosensitive resin composition usable with i-line and method of forming pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-30 | — | — | US | disclosed |
| EP-1126319-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-08-22 | — | — | EP | disclosed |
| EP-1087260-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-03-28 | — | — | EP | disclosed |