SCHEMBL6562646

SCHEMBL6562646

C=Cc1ccc(OC2CCCCO2)c2ccccc12

nearest known ligand 0.40

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 6/20 0.37
KDM4C Q9H3R0 1/20 0.35
PDE4B Q07343 2/20 0.34
GCGR P47871 1/20 0.34
ACP1 P24666 1/20 0.31
DHFR P00374 1/20 0.31
NOS3 P29474 1/20 0.30
NOS1 P29475 1/20 0.30
NOS2 P35228 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29869547 1.00 PTPN1 (0.37) PTPN1KDM4CPDE4BGCGRACP1
SCHEMBL6564864 0.96 PDE4B (0.37) PTPN1KDM4CPDE4BGCGR
SCHEMBL6362992 0.87 KDM4C (0.42) PTPN1KDM4CPDE4BACP1DHFR
SCHEMBL1355137 0.83 PTPN1 (0.39) PTPN1KDM4CPDE4BDHFR
SCHEMBL10745665 0.80 PDE4B (0.46) PTPN1KDM4CPDE4B
SCHEMBL8111504 0.79 PDE4B (0.36) PTPN1KDM4CPDE4B
SCHEMBL21339739 0.77 PTPN1 (0.39) PTPN1KDM4CPDE4BACP1DHFR
SCHEMBL30788461 0.76 KDM4C (0.41) PTPN1KDM4CPDE4BDHFR
SCHEMBL6342508 0.76 KDM4C (0.41) PTPN1KDM4CPDE4BDHFR
SCHEMBL11057549 0.76 KDM4C (0.44) KDM4CDHFR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109843853-B Composition and method for manufacturing device using the same 东洋合成工业株式会社 2022-09-20 CN disclosed
US-11142495-B2 Composition and method for manufacturing device using same TOYO GOSEI CO., LTD. (JP) 2021-10-12 US disclosed
US-20200048191-A1 COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME TOYO GOSEI CO., LTD. (JP) 2020-02-13 US disclosed
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200048191-A1 COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME LBR, LMTK2, MMS19 PTPN1 3659/4885KDM4C 3175/4885PDE4B 4467/4885
US-11142495-B2 Composition and method for manufacturing device using same LBR, LMTK2, MMS19 PTPN1 3659/4885KDM4C 3175/4885PDE4B 4467/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.