Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDE4B | Q07343 | 3/20 | 0.37 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.31 |
| ▸ | PDE4A | P27815 | 1/20 | 0.31 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.31 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.31 |
| ▸ | GCGR | P47871 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6562646 | 0.96 | PTPN1 (0.37) | PDE4BPTPN1KDM4CGCGR | |
| SCHEMBL29869547 | 0.96 | PTPN1 (0.37) | PDE4BPTPN1KDM4CGCGR | |
| SCHEMBL8111504 | 0.82 | PDE4B (0.36) | PDE4BPTPN1KDM4EKDM4C | |
| SCHEMBL6362992 | 0.82 | KDM4C (0.42) | PDE4BPTPN1KDM4ETSHRKDM4C | |
| SCHEMBL1355137 | 0.78 | PTPN1 (0.39) | PDE4BPTPN1KDM4EKDM4C | |
| SCHEMBL10745665 | 0.75 | PDE4B (0.46) | PDE4BPTPN1KDM4ETSHRKDM4C | |
| SCHEMBL3873875 | 0.74 | PDE4B (0.36) | PDE4BKDM4ETSHRKDM4CPDE4A | |
| SCHEMBL8528712 | 0.72 | PDE4B (0.50) | PDE4BPTPN1KDM4EPDE4APDE4C | |
| SCHEMBL21339739 | 0.72 | PTPN1 (0.39) | PDE4BPTPN1KDM4C | |
| SCHEMBL11057549 | 0.71 | KDM4C (0.44) | KDM4EKDM4C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |