SCHEMBL6562702

SCHEMBL6562702

CCCCO[Si](C#Cc1ccccc1)(C#Cc1ccccc1)C#Cc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.46
CHRNB2 P17787 1/20 0.41
CHRNB4 P30926 1/20 0.41
CHRNA3 P32297 1/20 0.41
CHRNA7 P36544 1/20 0.41
CHRNA4 P43681 1/20 0.41
TSHR P16473 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
CYP1A2 P05177 3/20 0.39
CYP2C9 P11712 3/20 0.39
CYP2C19 P33261 3/20 0.39
CYP2D6 P10635 3/20 0.39
CYP19A1 P11511 1/20 0.39
APP P05067 1/20 0.38
NOS1 P29475 1/20 0.38
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564403 0.89 APP (0.41) LTA4HCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL6562553 0.88 LTA4H (0.44) LTA4HCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL6562783 0.88 LTA4H (0.44) LTA4HCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL6562877 0.81 APP (0.44) LTA4HCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL6563886 0.80 APP (0.39) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL6562433 0.76 APP (0.39) LTA4HCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL6564478 0.76 APP (0.39) LTA4HCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL28942149 0.76 LTA4H (0.66) LTA4HCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL3484303 0.74 LTA4H (0.48) LTA4HCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL31470816 0.74 APP (0.41) LTA4HCYP1A2CYP2C9CYP2C19CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed