SCHEMBL6562930

SCHEMBL6562930

CC[Si](C#Cc1ccccc1)(OC(C)=O)OC(C)=O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.40
FFAR1 O14842 5/20 0.39
NPC1 O15118 3/20 0.38
RAB9A P51151 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
HTT P42858 2/20 0.38
NPSR1 Q6W5P4 1/20 0.38
CYP3A4 P08684 2/20 0.37
CYP2D6 P10635 2/20 0.37
CYP2C9 P11712 2/20 0.37
MAPT P10636 1/20 0.37
GAA P10253 1/20 0.37
KDM4E B2RXH2 1/20 0.37
MEN1 O00255 1/20 0.37
TP53 P04637 1/20 0.37
CYP1A2 P05177 1/20 0.37
PKM P14618 1/20 0.37
HPGD P15428 1/20 0.37
ALOX15 P16050 1/20 0.37
CYP2C19 P33261 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564032 0.85 FFAR1 (0.40) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL6561410 0.80 NPSR1 (0.42) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL6562696 0.80 NPSR1 (0.42) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL6561390 0.80 NPSR1 (0.42) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL6562614 0.78 NPSR1 (0.41) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL6561422 0.78 NPSR1 (0.41) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL6564071 0.78 GRM5 (0.42) ALDH1A1NPC1RAB9ASMN1; SMN2NPSR1
SCHEMBL6562755 0.77 NPSR1 (0.40) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL6564198 0.75 NPSR1 (0.39) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2
SCHEMBL6562546 0.75 NPSR1 (0.39) ALDH1A1FFAR1NPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed