SCHEMBL6564032

SCHEMBL6564032

CC[Si](C#Cc1ccccc1)(C#Cc1ccccc1)OC(C)=O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 4/20 0.40
HTT P42858 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
GAA P10253 1/20 0.38
PAM P19021 1/20 0.38
MMP2 P08253 1/20 0.37
MMP9 P14780 1/20 0.37
MMP12 P39900 1/20 0.37
MMP14 P50281 1/20 0.37
MMP15 P51511 1/20 0.37
MMP16 P51512 1/20 0.37
MMP26 Q9NRE1 1/20 0.37
ALDH1A1 P00352 2/20 0.37
FFAR4 Q5NUL3 1/20 0.37
MTNR1A P48039 1/20 0.36
MTNR1B P49286 1/20 0.36
VCP P55072 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6562930 0.85 ALDH1A1 (0.40) FFAR1HTTNPC1RAB9ASMN1; SMN2
SCHEMBL6562696 0.81 NPSR1 (0.42) FFAR1NPC1RAB9ASMN1; SMN2NPSR1
SCHEMBL6561410 0.81 NPSR1 (0.42) FFAR1NPC1RAB9ASMN1; SMN2NPSR1
SCHEMBL6561390 0.81 NPSR1 (0.42) FFAR1NPC1RAB9ASMN1; SMN2NPSR1
SCHEMBL6562619 0.80 APP (0.42) FFAR1HTTNPC1RAB9ASMN1; SMN2
SCHEMBL6561422 0.79 NPSR1 (0.41) FFAR1NPC1RAB9ASMN1; SMN2NPSR1
SCHEMBL6562614 0.79 NPSR1 (0.41) FFAR1NPC1RAB9ASMN1; SMN2NPSR1
SCHEMBL6562755 0.78 NPSR1 (0.40) FFAR1NPC1RAB9ASMN1; SMN2NPSR1
SCHEMBL6562557 0.77 APP (0.39) FFAR1HTTNPC1RAB9ASMN1; SMN2
SCHEMBL6564198 0.77 NPSR1 (0.39) FFAR1NPC1RAB9ASMN1; SMN2NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed