SCHEMBL6564005

SCHEMBL6564005

CCCCOC(=O)OC1CCS(OS(=O)(=O)C(F)(F)F)(c2ccccc2)C1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 4/20 0.33
TSHR P16473 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
MAPK1 P28482 2/20 0.32
KDM4E B2RXH2 1/20 0.32
CHRM2 P08172 2/20 0.32
CHRM1 P11229 2/20 0.32
CHRM3 P20309 2/20 0.32
POLB P06746 1/20 0.32
MLNR O43193 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
HRH1 P35367 1/20 0.32
OPRM1 P35372 1/20 0.32
DRD3 P35462 1/20 0.32
OPRK1 P41145 1/20 0.32
HTR2B P41595 1/20 0.32
SLC6A3 Q01959 1/20 0.32
KCNH2 Q12809 1/20 0.32
CACNA1C Q13936 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6562645 0.94 DRD3 (0.35) CHRM2CHRM1CHRM3MLNRHTR2A
SCHEMBL2675556 0.86 NOD2 (0.33) L3MBTL1TDP1ELANEGAA
SCHEMBL6566234 0.83 BCHE (0.31) BCHE
SCHEMBL6564010 0.81 DRD3 (0.33) CHRM2CHRM1CHRM3MLNRHTR2A
SCHEMBL2675037 0.81 MLNR (0.32) CHRM2CHRM1CHRM3MLNRHTR2A
SCHEMBL6564778 0.79 DRD2 (0.32) DRD3
SCHEMBL3163310 0.78 NOD2 (0.31)
SCHEMBL4868264 0.78 NOD2 (0.31)
SCHEMBL6562810 0.77
SCHEMBL2674958 0.76 KDM4E (0.33) TSHRMAPK1KDM4EPOLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed