Methane

Methane

SCHEMBL6564041

C.OC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.46
GRIN2D O15399 4/20 0.42
GRIN3B O60391 4/20 0.42
GRIN1 Q05586 4/20 0.42
GRIN2A Q12879 4/20 0.42
GRIN2B Q13224 4/20 0.42
GRIN2C Q14957 4/20 0.42
GRIN3A Q8TCU5 4/20 0.42
LMNA P02545 2/20 0.42
SLC22A2 O15244 2/20 0.42
SLC47A1 Q96FL8 2/20 0.42
SLC22A1 O15245 1/20 0.42
TSHR P16473 1/20 0.42
NFKB1 P19838 1/20 0.42
STAT6 P42226 1/20 0.42
SIGMAR1 Q99720 1/20 0.42
POLB P06746 1/20 0.40
THRB P10828 1/20 0.40
BLM P54132 1/20 0.40
PMP22 Q01453 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL148421 0.96 PKM (0.48) PKMGRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL2126658 0.96 PKM (0.48) PKMGRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL29646136 0.96 PKM (0.48) PKMGRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL1150449 0.96 PKM (0.48) PKMGRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL23333268 0.96 PKM (0.48) PKMGRIN2DGRIN3BGRIN1GRIN2A
Methyl Alcohol SCHEMBL27518598 0.94 PKM (0.42) PKMGRIN2DGRIN3BGRIN1GRIN2A
Adamantane SCHEMBL8487115 0.93 PKM (0.46) PKMGRIN2DGRIN3BGRIN1GRIN2A
Ammonia Solution, Strong SCHEMBL572798 0.93 PKM (0.46) PKMGRIN2DGRIN3BGRIN1GRIN2A
Hydrochloric Acid SCHEMBL4717994 0.93 LMNA (0.47) PKMGRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL31665947 0.93 PKM (0.46) PKMGRIN2DGRIN3BGRIN1GRIN2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed