SCHEMBL6564979

SCHEMBL6564979

CCCSC(=S)NC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564986 0.85
SCHEMBL6563268 0.78
SCHEMBL9179838 0.77
SCHEMBL27832941 0.77
SCHEMBL9680536 0.77
SCHEMBL27832990 0.77
SCHEMBL8324296 0.77
SCHEMBL27265442 0.75 KEAP1 (0.40)
SCHEMBL11609249 0.73 L3MBTL1 (0.41)
SCHEMBL28369854 0.73 KEAP1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105607426-B Polymer, chemical amplification negative resist composition and pattern forming method SHIN ETSU CHEMICAL COMPANY (JP) 2019-11-01 CN disclosed
CN-105968409-B Thio epoxy base system optical material polymerism synthetic and thio epoxy base system optical material manufacturing method 可奥熙搜路司有限公司 2019-07-30 CN disclosed
CN-104053657-B Process for producing thioepoxy optical material and polymerizable composition thereof 可奥熙搜路司有限公司 2017-04-26 CN disclosed
CN-102516453-B Polymer, chemically amplified negative resist composition and pattern forming method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-01 CN disclosed
CN-102321212-B Polymkeric substance, chemical-amplification positive anti-corrosion agent composition and pattern formation method SHIN-ETSU CHEMICAL INDUSTRY CO., LTD. (JP) 2015-08-19 CN disclosed
CN-102096321-B Negative resist composition and patterning process SHINETSU CHEMICAL CO 2015-05-13 CN disclosed
CN-102081304-B Negative resist composition and patterning process SHINETSU CHEMICAL CO 2013-03-20 CN disclosed
CN-102516453-A Polymer, chemically amplified negative resist composition and pattern forming method SHINETSU CHEMICAL CO 2012-06-27 CN disclosed
CN-102321212-A Polymer, chemically amplified positive resist composition and pattern forming process SHINETSU CHEMICAL CO 2012-01-18 CN disclosed
CN-101006114-B Polymerisable composition containing an odour masking agent and a perfume, an optical lens and a production method ESSILOR INT 2011-09-21 CN disclosed
EP-0453677-A1 Depression of the flotation of silica or siliceous gangue in mineral flotation THE DOW CHEMICAL COMPANY (US) 1991-10-30 EP disclosed
US-5057209-A Adding alkanolamine THE DOW CHEMICAL COMPANY (US) 1991-10-15 US disclosed
CN-1055110-A Liquid medicine FUJISAWA PHARMACEUTICAL CO (JP) 1991-10-09 CN disclosed
CN-1013687-B Tricyclic compounds, process for their production and pharmaceutical compositions containing them FUJISAWA PHARMACEUTICAL CO (JP) 1991-08-28 CN disclosed
US-4822483-A DIAMINE OR AMIDE AND THIOCARBONATE, THIOCARBAMATE, THIOPHOSPHATE, MERCAPTAN, XANTHIC ESTER THE DOW CHEMICAL COMPANY (US) 1989-04-18 US disclosed
US-4702822-A ORGANIC SULFIDE WITH ALKYL THIOCARBONATE, THIONACARBAMATEA, OR THIOPHOSPHATE THE DOW CHEMICAL COMPANY (US) 1987-10-27 US disclosed
US-4684459-A Collector compositions for the froth flotation of mineral values THE DOW CHEMICAL COMPANY (US) 1987-08-04 US disclosed
WO-1987003221-A1 NOVEL COLLECTORS FOR FROTH FLOTATION OF MINERALS THE DOW CHEMICAL COMPANY (US) 1987-06-04 WO disclosed
WO-1987000451-A1 NOVEL COLLECTOR COMPOSITION FOR FROTH FLOTATION THE DOW CHEMICAL COMPANY (US) 1987-01-29 WO disclosed
CN-85109492-A Tricyclic compounds, process for their production and pharmaceutical compositions containing them 1986-06-10 CN disclosed