SCHEMBL6566141

SCHEMBL6566141

CCOC(=O)c1cccc(C(=O)OC2CCCCC2)c1

nearest known ligand 0.53

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.53
MAPK1 P28482 1/20 0.53
ALOX15 P16050 2/20 0.50
ATM Q13315 1/20 0.48
CYP4F2 P78329 1/20 0.48
CYP4A11 Q02928 1/20 0.48
HTT P42858 1/20 0.47
KMT2A Q03164 1/20 0.47
MAPT P10636 1/20 0.47
GALR1 P47211 1/20 0.46
JMJD6 Q6NYC1 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL483590 0.88 HTT (0.58) ALDH1A1MAPK1ALOX15HTTMAPT
SCHEMBL111296 0.88 MMP9 (0.55) ALDH1A1HTTKMT2AMAPTJMJD6
SCHEMBL8414315 0.87 MMP9 (0.47) ALDH1A1HTTKMT2AMAPTJMJD6
SCHEMBL27468353 0.85 ALDH1A1 (0.44) ALDH1A1HTTKMT2AJMJD6
Ethylene Glycol SCHEMBL27957091 0.84 HTT (0.54) ALDH1A1MAPK1ALOX15HTTMAPT
SCHEMBL27766361 0.84 ALDH1A1 (0.48) ALDH1A1HTTKMT2AMAPTJMJD6
SCHEMBL31205426 0.84 NPC1 (0.56) ALDH1A1HTTKMT2AMAPTJMJD6
SCHEMBL6056992 0.84 NPC1 (0.56) ALDH1A1HTTKMT2AMAPTJMJD6
SCHEMBL20285817 0.84 NPC1 (0.56) ALDH1A1HTTKMT2AMAPTJMJD6
SCHEMBL31205812 0.84 NPC1 (0.56) ALDH1A1HTTKMT2AMAPTJMJD6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2682255-B1 THERMOPLASTIC RESIN COMPOSITION, AND MOLDED PRODUCT THEREOF TORAY INDUSTRIES (JP) 2015-12-16 EP disclosed
US-20130331500-A1 THERMOPLASTIC RESIN COMPOSITION, AND MOLDED PRODUCT THEREOF TORAY INDUSTRIES, INC. (JP) 2013-12-12 US disclosed
CN-1225504-C Flame retardant resin composition TORAY INDUSTRIES (JP) 2005-11-02 CN disclosed
EP-1431816-A1 Photographic multi-layer polyester film base comprising 1,4-cyclohexane dimethanol repeating units EASTMAN KODAK COMPANY (US) 2004-06-23 EP disclosed
US-6737226-B1 HEATSETTING A BIAXIALLY STRETCHED CYCLOHEXANEDIMETHANOL -CONTAINING POLYETHYLENE TEREPHTHALATE; IMPROVED PROPERTIES WITH REGARD TO CUTTING, CHOPPING, AND PERFORATING EASTMAN KODAK COMPANY 2004-05-18 US disclosed
US-20040081928-A1 PROCESS FOR MAKING POLYESTER PHOTOGRAPHIC FILM BASE AND PHOTOGRAPHIC ELEMENT COMPRISING SAID BASE EASTMAN KODAK COMPANY 2004-04-29 US disclosed
US-6670110-B1 Film base comprises tie layer having controlled amount of monomeric units derived from 1,4-cyclohexanedimethanol such that delamination is prevented EASTMAN KODAK COMPANY 2003-12-30 US disclosed