SCHEMBL65664

SCHEMBL65664

COc1ccccn1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15561907 1.00 KDM4E (0.50) —
SCHEMBL29531218 1.00 — —
Hydrochloric Acid SCHEMBL8914539 0.97 — —
SCHEMBL28091796 0.97 — —
Hydrochloric Acid SCHEMBL7736230 0.97 KDM4E (0.48) —
Hydrochloric Acid SCHEMBL29077445 0.97 — —
SCHEMBL30065146 0.97 — —
Hydrochloric Acid SCHEMBL10488706 0.97 KDM4E (0.48) —
Bromide SCHEMBL34472696 0.97 KDM4E (0.48) —
Bromide SCHEMBL28197991 0.97 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 7725 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260132126-A1 IMIDAZOLE DERIVATIVES SANWA KAGAKU KENKYUSHO CO., LTD. (JP) 2026-05-14 — — US claimed
US-12486260-B2 Indazolyl-isoxazole derivatives for the treatment of diseases such as cancer MERCK PATENT GMBH (DE) 2025-12-02 — — US claimed
US-20250361244-A1 BICYCLIC HETEROCYCLYL DERIVATIVES AS IRAK4 INHIBITORS AURIGENE ONCOLOGY LTD (IN) 2025-11-27 — — US claimed
EP-4607278-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT Ycchem Co., Ltd. (KR) 2025-08-27 — — EP claimed
EP-4603489-A1 IMIDAZOLE DERIVATIVE SANWA KAGAKU KENKYUSHO CO., LTD. (JP) 2025-08-20 — — EP claimed
US-20250199405-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT YCCHEM CO., LTD. (KR) 2025-06-19 — — US claimed
US-12331239-B2 Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt BASF SE (DE) 2025-06-17 — — US claimed
CN-119998277-A Imidazole derivatives 株式会社三和化学研究所 2025-05-13 — — CN claimed
CN-119998727-A Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance YC化学制品株式会社 2025-05-13 — — CN claimed
CN-119707785-A Bipyridine-based multifunctional ionic liquid and preparation method and application thereof 湖南师范大学 2025-03-28 — — CN claimed
CN-1004488-B Self-curing urethane bond paste system 雅士兰石油公司 1989-06-14 — — CN claimed
CN-86104759-A The ethyl carbamate binding paste system of self cure — 1987-05-13 — — CN claimed
CN-85109303-A The 2-phenylpyran is the preparation method of [2,3-b] pyridine compounds and their also — 1986-08-20 — — CN claimed
EP-0097620-B1 HEAT OR PRESSURE SENSITIVE REGISTRATION MATERIAL CIBA-GEIGY AG (CH) 1986-07-30 — — EP claimed
EP-0178633-A2 2-phenylpyrano[2,3-b]pyridines MERRELL DOW PHARMACEUTICALS INC. (US) 1986-04-23 — — EP claimed
US-4513302-A Pressure-sensitive or heat-sensitive recording material CIBA-GEIGY CORPORATION (US) 1985-04-23 — — US claimed
EP-0097620-A2 Heat or pressure sensitive registration material CIBA-GEIGY AG (CH) 1984-01-04 — — EP claimed
US-4138553-A 3-Methylene cephalosporanic acid derivatives and process for preparation thereof TEIJIN LIMITED (JP) 1979-02-06 — — US claimed
US-4045535-A MIXING MOLD; CURING RESMENT INC. (US) 1977-08-30 — — US claimed
US-3980664-A ANTIMICROBIAL; 2-METHOXYPYRIDINE WITH BROMOMETHYL-5-NITRO-2-FURYL KETONE MORTON-NORWICH PRODUCTS, INC. (US) 1976-09-14 — — US claimed
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