Phenol

Phenol

SCHEMBL657540

Cc1c(O)cccc1C=O.Oc1ccccc1

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRIM24 O15164 2/20 0.55
TRIM33 Q9UPN9 2/20 0.55
ERN1 O75460 3/20 0.52
CA1 P00915 3/20 0.49
CA2 P00918 3/20 0.49
ALDH1A1 P00352 1/20 0.45
TSHR P16473 1/20 0.45
CA4 P22748 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
LMNA P02545 2/20 0.43
NFKB1 P19838 2/20 0.43
MEN1 O00255 1/20 0.43
THRB P10828 1/20 0.43
BLM P54132 1/20 0.43
KMT2A Q03164 1/20 0.43
TRPA1 O75762 2/20 0.42
ATM Q13315 1/20 0.42
CA12 O43570 1/20 0.41
GLA P06280 1/20 0.41
CA3 P07451 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenol SCHEMBL28209139 1.00 TRIM24 (0.55) TRIM24TRIM33ERN1CA1CA2
Hydroquinone SCHEMBL28407198 0.92 ERN1 (0.55) TRIM24TRIM33ERN1CA1CA2
Phenol SCHEMBL28102554 0.91 TRIM24 (0.46) TRIM24TRIM33ERN1CA1CA2
SCHEMBL210332 0.90 ERN1 (0.61) TRIM24TRIM33ERN1CA1CA2
SCHEMBL29352630 0.90 ERN1 (0.61) TRIM24TRIM33ERN1CA1CA2
Resorcinol SCHEMBL11728630 0.89 ERN1 (0.52) TRIM24TRIM33ERN1CA1CA2
SCHEMBL30645184 0.88 ERN1 (0.59) TRIM24TRIM33ERN1CA1CA2
Hydrochloric Acid SCHEMBL31180780 0.88 ERN1 (0.59) TRIM24TRIM33ERN1CA1CA2
Phenol SCHEMBL9774594 0.85 ALDH1A1 (0.55) TRIM24TRIM33ERN1CA1CA2
Metacresol SCHEMBL28223396 0.84 ACHE (0.57) TRIM24TRIM33ERN1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 624 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110609444-A Positive thermosensitive CTP photosensitive emulsion and preparation method thereof 河北金锐美科技有限公司 2019-12-24 CN claimed
CN-103587272-B A kind of temperature-sensitive grain-free printing plate and the preparation method and application thereof 北京中科纳新印刷技术有限公司 2019-01-18 CN claimed
US-20110275758-A1 MODIFIED PHENOLIC RESINS HUTTENES-ALBERTUS CHEMISCHE WERKE GMBH (DE) 2011-11-10 US claimed
US-20110269902-A1 MODIFIED PHENOLIC RESINS HUTTENES-ALBERTUS CHEMISCHE WERKE GMBH (DE) 2011-11-03 US claimed
CN-100440040-C Non-diazo naphthaquinone type positive map PS plate photosensitive composition and positive map thermosensitive CTP plate image forming composition UNIV BEIJING NORMAL (CN) 2008-12-03 CN claimed
CN-1512271-A Non-diazo naphthaquinone type positive map PS plate photosensitive composition and positive map thermosensitive CTP plate image forming composition 北京师范大学 2004-07-14 CN claimed
US-5238771-A A blends of phenolic resins, polyoxyalkylene glycol sorbitol ether or fatty acid ester, polyoxypropylene glycol fatty acid ester or faty alcohol ether and modified polyoxyethylene glycol; chemical resistance KONICA CORPORATION (JP) 1993-08-24 US claimed
EP-0442952-B1 POSITIVE-WORKING PHOTORESISTS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT OCG MICROELECTRONIC MATERIALS, INC. (US) 1993-02-10 EP claimed
US-4965167-A Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent OLIN HUNT SPECIALTY PRODUCTS, INC. (US) 1990-10-23 US claimed
US-4845008-A QUICK-DRYING, LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1989-07-04 US claimed
US-4837121-A POSITIVE-WORKING PHOTORESISTS OLIN HUNT SPECIALTY PRODUCTS INC. (US) 1989-06-06 US claimed
EP-0054258-B1 PHOTOSENSITIVE COMPOSITIONS KONICA CORPORATION (JP) 1986-03-05 EP claimed
US-4477553-A AN O QUINONEDIAZIDE AND A DIHYDROXYBENZENE-BASED PHENOLIC OR POLYPHENYL RESIN BINDER; LITHOGRAPHIC PRINTING PLATES KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-10-16 US claimed
US-4092218-A Fuel element for high temperature reactors NUKEM GMBH (DT) 1978-05-30 US claimed
CN-110806677-A Photoresist composition, pattern forming method and application thereof 常州强力先端电子材料有限公司 2020-02-18 CN disclosed
EP-2893397-B1 POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS AND USE EASTMAN KODAK CO (US) 2020-02-05 EP disclosed
CN-110609444-A Positive thermosensitive CTP photosensitive emulsion and preparation method thereof 河北金锐美科技有限公司 2019-12-24 CN disclosed
EP-0097503-A2 Process for preparing a lithographic printing plate KONICA CORPORATION (JP) 1984-01-04 EP disclosed
EP-0067001-A2 Developer composition KONICA CORPORATION (JP) 1982-12-15 EP disclosed
EP-0054258-A2 Photosensitive compositions KONICA CORPORATION (JP) 1982-06-23 EP disclosed