Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 2/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | SNCA | P37840 | 1/20 | 0.45 |
| ▸ | PKM | P14618 | 2/20 | 0.44 |
| ▸ | CA1 | P00915 | 2/20 | 0.44 |
| ▸ | CA2 | P00918 | 2/20 | 0.44 |
| ▸ | MMP1 | P03956 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 1/20 | 0.44 |
| ▸ | MMP9 | P14780 | 1/20 | 0.44 |
| ▸ | MMP8 | P22894 | 1/20 | 0.44 |
| ▸ | MMP13 | P45452 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Cyclopentanol SCHEMBL1554394 | 0.92 | CYP2D6 (0.51) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| Cyclohexanol SCHEMBL1553521 | 0.91 | ALDH1A1 (0.51) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| SCHEMBL10762325 | 0.88 | CYP2D6 (0.46) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| SCHEMBL10409068 | 0.88 | CYP2D6 (0.46) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| SCHEMBL2489459 | 0.86 | CYP2D6 (0.55) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| SCHEMBL1705904 | 0.85 | GAA (0.62) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| SCHEMBL34 | 0.85 | GAA (0.62) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| SCHEMBL31313 | 0.85 | GAA (0.62) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| SCHEMBL5068661 | 0.85 | GAA (0.62) | CYP2D6ALDH1A1LMNAHTTKDM4E | |
| SCHEMBL11432043 | 0.85 | GAA (0.62) | CYP2D6ALDH1A1LMNAHTTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115482716-A | Tamper-proof certificate card containing holographic anti-counterfeiting mark and manufacturing method thereof | 深圳市深大极光科技有限公司 | 2022-12-16 | — | — | CN | disclosed |
| US-11450445-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2022-09-20 | — | — | US | disclosed |
| CN-114179549-A | Anti-fake certificate card with anti-fake mark and its making process | 公安部交通管理科学研究所 | 2022-03-15 | — | — | CN | disclosed |
| US-20200303086-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-09-24 | — | — | US | disclosed |
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-9982157-B2 | Aqueous laser-sensitive composition for marking substrates | DATALASE LTD. (GB) | 2018-05-29 | — | — | US | disclosed |
| US-20170309363-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2017-10-26 | — | — | US | disclosed |
| US-9333786-B2 | Laser-sensitive coating formulations | DATALASE, LTD. (GB) | 2016-05-10 | — | — | US | disclosed |
| US-9267042-B2 | Coating composition for marking substrates | DATALASE LTD. (GB) | 2016-02-23 | — | — | US | disclosed |
| US-20150361289-A1 | AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES | DATALASE LTD. (GB) | 2015-12-17 | — | — | US | disclosed |
| US-20120045624-A1 | AQUEOUS LASER-SENSITIVE COMPOSITION FOR MARKING SUBSTRATES | BASF SE (DE) | 2012-02-23 | — | — | US | disclosed |
| US-20110274893-A1 | COATING COMPOSITION FOR MARKING SUBSTRATES | BASF SE (DE) | 2011-11-10 | — | — | US | disclosed |
| US-8021820-B2 | Coating composition for marking substrates | DATALASE LTD. (GB) | 2011-09-20 | — | — | US | disclosed |
| US-20100233447-A1 | LASER-SENSITIVE COATING FORMULATIONS | CIBA CORPORATION (US) | 2010-09-16 | — | — | US | disclosed |
| US-20090191420-A1 | Coating Composition for Marking Substrates | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2009-07-30 | — | — | US | disclosed |