SCHEMBL659280

SCHEMBL659280

C=CO[C@H]1CO[C@H]2[C@@H]1OC[C@H]2OC=C

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38
TDP1 Q9NUW8 1/20 0.33
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1178704 1.00 ALDH1A1 (0.38) ALDH1A1TDP1MAPT
SCHEMBL15786375 1.00 ALDH1A1 (0.38) ALDH1A1TDP1MAPT
SCHEMBL16689088 0.89 ALDH1A1 (0.32) ALDH1A1
SCHEMBL6104824 0.87 THRB (0.52) ALDH1A1MAPT
SCHEMBL13966305 0.87 THRB (0.52) ALDH1A1MAPT
SCHEMBL6104672 0.87 THRB (0.52) ALDH1A1MAPT
SCHEMBL24089792 0.81
SCHEMBL16689083 0.81
SCHEMBL16689096 0.78 TDP1 (0.39) ALDH1A1TDP1
SCHEMBL19113737 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117820944-A Preparation method of parylene film layer for surface coating of electronic circuit module 烟台舜康生物科技有限公司 2024-04-05 CN claimed
US-20200071564-A1 COATING COMPOSITION AND COATED ARTICLE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US claimed
EP-2928895-B1 DERIVATIVES OF DIANHYDROHEXITOL AND THEIR USE AS CROSSLINKABLE COMPOSITIONS ROQUETTE FRERES (FR) 2020-01-08 EP claimed
CN-110590797-A Method for synthesizing isosorbide divinyl ether 荆州市新景化工有限责任公司 2019-12-20 CN claimed
EP-3418337-A1 COATING COMPOSITION AND COATED ARTICLE Shin-Etsu Chemical Co., Ltd. (JP) 2018-12-26 EP claimed
EP-2928969-B1 CROSS-LINKABLE COMPOSITIONS BASED ON DIANHYDROHEXITOL COMPOUNDS ROQUETTE FRERES (FR) 2017-08-02 EP claimed
US-20240210817-A1 RESIN MOLDED ARTICLE PRODUCTION METHOD AND OPTICAL COMPONENT PRODUCTION METHOD DAICEL CORPORATION (JP) 2024-06-27 US disclosed
WO-2024135086-A1 PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE 株式会社ダイセル 2024-06-27 WO disclosed
WO-2024095928-A1 EPOXY COMPOUND PRODUCT 株式会社ダイセル 2024-05-10 WO disclosed
CN-117820944-A Preparation method of parylene film layer for surface coating of electronic circuit module 烟台舜康生物科技有限公司 2024-04-05 CN disclosed
CN-117820944-A Preparation method of parylene film layer for surface coating of electronic circuit module 烟台舜康生物科技有限公司 2024-04-05 CN disclosed
US-11927884-B2 Resin molded article production method and optical component production method DAICEL CORPORATION (JP) 2024-03-12 US disclosed
EP-3611206-B1 MONOMER MIXTURE AND CURABLE COMPOSITION CONTAINING SAME DAICEL CORP (JP) 2024-02-21 EP disclosed
US-20150086907-A1 PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, VOLUME HOLOGRAM RECORDING MEDIUM USING SAME, METHOD FOR MANUFACTURING VOLUME HOLOGRAM RECORDING MEDIUM, AND HOLOGRAM RECORDING METHOD DAICEL CORPORATION (JP) 2015-03-26 US disclosed
CN-103304774-A Resin composition for fiber-reinforced composite material, prepreg, and fiber-reinforced composite material DAICEL FINECHEM LTD 2013-09-18 CN disclosed
US-20120044550-A1 TRANSMISSION TYPE VOLUME HOLOGRAM RECORDING MEDIUM AND MANUFACTURING METHOD THEREOF DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2012-02-23 US disclosed
US-20110200918-A1 PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING AND PRODUCING METHOD THEREOF DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2011-08-18 US disclosed
CN-100523102-C inkjet ink TOSHIBA TEC KK (JP) 2009-08-05 CN disclosed
CN-1290945-C Inkjet ink TOSHIBA TEC KK (JP) 2006-12-20 CN disclosed
CN-1654559-A Inkjet ink TOSHIBA TEC KK (JP) 2005-08-17 CN disclosed