Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.49 |
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | BCHE | P06276 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.43 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.43 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.43 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.43 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.43 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.43 |
| ▸ | DRD1 | P21728 | 1/20 | 0.43 |
| ▸ | HRH2 | P25021 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL64545 | 0.98 | KMT2A (0.51) | SLC18A3KMT2AMEN1HPGDALDH1A1 | |
| Hydrochloric Acid SCHEMBL7423278 | 0.96 | KMT2A (0.50) | SLC18A3KMT2AMEN1HPGDALDH1A1 | |
| SCHEMBL14500225 | 0.94 | SLC18A3 (0.51) | SLC18A3KMT2AMEN1HPGDALDH1A1 | |
| SCHEMBL20609092 | 0.91 | SLC18A3 (0.56) | SLC18A3KMT2AMEN1ALDH1A1NPSR1 | |
| SCHEMBL9328257 | 0.91 | — | — | |
| SCHEMBL21861967 | 0.88 | CYP2D6 (0.51) | KMT2AMEN1ALDH1A1POLBMAPT | |
| SCHEMBL12014418 | 0.87 | SIGMAR1 (0.44) | SLC18A3KMT2AMEN1ALDH1A1CYP1A2 | |
| SCHEMBL14262617 | 0.86 | ATM (0.48) | SLC18A3KMT2AMEN1HPGDALDH1A1 | |
| SCHEMBL23407993 | 0.86 | ALDH1A1 (0.49) | KMT2AMEN1ALDH1A1HRH3CYP1A2 | |
| SCHEMBL12014417 | 0.85 | KMT2A (0.45) | SLC18A3KMT2AMEN1HPGDCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 488 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1264212-B1 | ELEMENTS FOR FORMING PRINT-OUT IMAGES | DU PONT (US) | 2009-02-18 | — | — | EP | claimed |
| US-6869755-B2 | Elements for forming print-out images | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-03-22 | — | — | US | claimed |
| EP-1264212-A2 | ELEMENTS FOR FORMING PRINT-OUT IMAGES | E. I. du Pont de Nemours and Company (US) | 2002-12-11 | — | — | EP | claimed |
| US-20020146649-A1 | Elements for forming print-out images | E. I. DU PONT DE NEMOURS AND COMPANY | 2002-10-10 | — | — | US | claimed |
| WO-2001067175-A2 | ELEMENTS FOR FORMING PRINT-OUT IMAGES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-09-13 | — | — | WO | claimed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| US-12032287-B2 | Resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| US-11994798-B2 | Resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-28 | — | — | US | disclosed |
| US-20210063871-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| US-20210063873-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-20020061463-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-23 | — | — | US | disclosed |
| EP-1195390-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-10 | — | — | EP | disclosed |
| WO-2001067175-A2 | ELEMENTS FOR FORMING PRINT-OUT IMAGES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-09-13 | — | — | WO | disclosed |
| US-4868294-A | ANTIBIOTICS | BRISTOL-MYERS COMPANY (US) | 1989-09-19 | — | — | US | disclosed |
| EP-0233271-A4 | PROCESS FOR PREPARING CEPHALOSPORIN INTERMEDIATES. | BRISTOL MYERS CO (US) | 1988-10-20 | — | — | EP | disclosed |
| US-4714760-A | ANTIBIOTICS | BRISTOL-MYERS COMPANY (US) | 1987-12-22 | — | — | US | disclosed |
| EP-0233271-A1 | PROCESS FOR PREPARING CEPHALOSPORIN INTERMEDIATES. | BRISTOL MYERS CO (US) | 1987-08-26 | — | — | EP | disclosed |
| WO-1987001116-A1 | PROCESS FOR PREPARING CEPHALOSPORIN INTERMEDIATES | BRISTOL-MYERS COMPANY (US) | 1987-02-26 | — | — | WO | disclosed |