⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1479693 | 0.78 | — | — | |
| SCHEMBL2686967 | 0.71 | — | — | |
| SCHEMBL19813173 | 0.71 | ALDH1A1 (0.39) | — | |
| SCHEMBL7556421 | 0.71 | — | — | |
| SCHEMBL1270984 | 0.71 | — | — | |
| SCHEMBL9559557 | 0.69 | — | — | |
| SCHEMBL25231455 | 0.66 | — | — | |
| SCHEMBL133149 | 0.62 | — | — | |
| SCHEMBL133588 | 0.62 | — | — | |
| SCHEMBL14102587 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 994 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260139365-A1 | METHOD FOR PRODUCING FILMS CONTAINING AMORPHOUS CARBON, AND PRODUCTS | LAIR LIQUIDE SA POUR LETUDE ET LEXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2026-05-21 | — | — | US | claimed |
| US-20250299946-A1 | METHOD FOR FORMING CONFORMAL SILICON OXIDE THIN FILM | APPLIED MATERIALS, INC. (US) | 2025-09-25 | — | — | US | claimed |
| US-20250301746-A1 | REDUCING K VALUES OF DIELECTRIC FILMS THROUGH ANNEAL | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-09-25 | — | — | US | claimed |
| US-12426335-B2 | Reducing k values of dielectric films through anneal | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-09-23 | — | — | US | claimed |
| CN-119822791-A | Extrusion-molded magnesium oxide tube and processing technology thereof | 盐城市林宇电器有限公司 | 2025-04-15 | — | — | CN | claimed |
| WO-2025076009-A1 | SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES | VERSUM MATERIALS US, LLC (US) | 2025-04-10 | — | — | WO | claimed |
| CN-113270485-B | Semiconductor structure and method for manufacturing semiconductor structure | 台湾积体电路制造股份有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-113658916-B | Semiconductor device and method for manufacturing the same | 台湾积体电路制造股份有限公司 | 2025-03-21 | — | — | CN | claimed |
| US-12206013-B2 | Post-formation mends of dielectric features | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-01-21 | — | — | US | claimed |
| US-12206012-B2 | Reducing K values of dielectric films through anneal | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-01-21 | — | — | US | claimed |
| US-20160211135-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND RECORDING MEDIUM | HITACHI KOKUSAI ELECTRIC INC. (JP) | 2016-07-21 | — | — | US | claimed |
| US-20160002782-A1 | Catalytic Atomic Layer Deposition Of Films Comprising SiOC | APPLIED MATERIALS, INC. | 2016-01-07 | — | — | US | claimed |
| US-20160002039-A1 | Low Temperature Atomic Layer Deposition Of Films Comprising SiCN OR SiCON | APPLIED MATERIALS, INC. | 2016-01-07 | — | — | US | claimed |
| US-20150252477-A1 | IN-SITU CARBON AND OXIDE DOPING OF ATOMIC LAYER DEPOSITION SILICON NITRIDE FILMS | APPLIED MATERIALS, INC. | 2015-09-10 | — | — | US | claimed |
| US-20150162185-A1 | ATOMIC LAYER DEPOSITION OF SILICON CARBON NITRIDE BASED MATERIALS | ASM IP HOLDING B.V. (NL) | 2015-06-11 | — | — | US | claimed |
| US-8026035-B2 | Organosilicon polymer containing chromogen; antireflactivity coating for lithography | CHEIL INDUSTRIES, INC. (KR) | 2011-09-27 | — | — | US | claimed |
| US-20100040858-A1 | TiO2-coated CNT, TiO2-coated CNT reinforced polymer composite and methods of preparation thereof | NATIONAL TSING HUA UNIVERSITY (TW) | 2010-02-18 | — | — | US | claimed |
| US-20080242785-A1 | TiO2-coated CNT, TiO2-coated CNT reinforced polymer composite and methods of preparation thereof | NATIONAL TSING HUA UNIVERSITY (TW) | 2008-10-02 | — | — | US | claimed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | claimed |
| WO-2007123309-A1 | MESOPOROUS INORGANIC COMPOSITE POWDER CONTAINING METAL ELEMENT IN ITS STRUCTURE AND THE METHOD FOR MANUFACTURING THEREOF | AMOREPACIFIC CORPORATION (KR) | 2007-11-01 | — | — | WO | claimed |