⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9559557 | 0.79 | — | — | |
| SCHEMBL660643 | 0.78 | — | — | |
| SCHEMBL12752676 | 0.71 | — | — | |
| SCHEMBL2463466 | 0.64 | ALDH1A1 (0.39) | — | |
| SCHEMBL19813173 | 0.64 | ALDH1A1 (0.39) | — | |
| SCHEMBL2102008 | 0.64 | ALDH1A1 (0.39) | — | |
| SCHEMBL1270984 | 0.64 | — | — | |
| SCHEMBL2686967 | 0.64 | — | — | |
| SCHEMBL9392907 | 0.64 | ALDH1A1 (0.39) | — | |
| SCHEMBL7556421 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025226985-A1 | PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES | VERSUM MATERIALS US, LLC (US) | 2025-10-30 | — | — | WO | claimed |
| US-20250270096-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MAT US LLC (US) | 2025-08-28 | — | — | US | claimed |
| US-12297115-B2 | High temperature atomic layer deposition of silicon-containing film | VERSUM MATERIALS US, LLC (US) | 2025-05-13 | — | — | US | claimed |
| WO-2025076009-A1 | SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES | VERSUM MATERIALS US, LLC (US) | 2025-04-10 | — | — | WO | claimed |
| US-20240304438-A1 | COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2024-09-12 | — | — | US | claimed |
| EP-3620550-B1 | METHODS FOR MAKING SILICON CONTAINING FILMS THAT HAVE HIGH CARBON CONTENT | VERSUM MAT US LLC (US) | 2024-05-01 | — | — | EP | claimed |
| US-20230377874-A1 | COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MATERIALS US, LLC | 2023-11-23 | — | — | US | claimed |
| EP-3620549-B1 | METHODS FOR MAKING SILICON AND NITROGEN CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-11-08 | — | — | EP | claimed |
| EP-4253597-A2 | COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | Versum Materials US, LLC (US) | 2023-10-04 | — | — | EP | claimed |
| US-11742200-B2 | Composition and methods using same for carbon doped silicon containing films | VERSUM MATERIALS US, LLC (US) | 2023-08-29 | — | — | US | claimed |
| US-20210380418-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MATERIALS US, LLC (US) | 2021-12-09 | — | — | US | claimed |
| US-11152206-B2 | Compositions and methods using same for carbon doped silicon containing films | VERSUM MATERIALS US, LLC (US) | 2021-10-19 | — | — | US | claimed |
| CN-112969817-A | High temperature atomic layer deposition of silicon-containing films | 弗萨姆材料美国有限责任公司 | 2021-06-15 | — | — | CN | claimed |
| US-10985010-B2 | Methods for making silicon and nitrogen containing films | VERSUM MATERIALS US, LLC (US) | 2021-04-20 | — | — | US | claimed |
| US-20200203155-A1 | Compositions And Methods Using Same For Carbon Doped Silicon Containing Films | VERSUM MATERIALS US, LLC (US) | 2020-06-25 | — | — | US | claimed |
| EP-3620549-A1 | METHODS FOR MAKING SILICON AND NITROGEN CONTAINING FILMS | Versum Materials US, LLC (US) | 2020-03-11 | — | — | EP | claimed |
| EP-3620550-A1 | METHODS FOR MAKING SILICON CONTAINING FILMS THAT HAVE HIGH CARBON CONTENT | Versum Materials US, LLC (US) | 2020-03-11 | — | — | EP | claimed |
| US-20200071819-A1 | Methods For Making Silicon Containing Films That Have High Carbon Content | VERSUM MATERIALS US, LLC (US) | 2020-03-05 | — | — | US | claimed |
| US-20200075312-A1 | Methods For Making Silicon And Nitrogen Containing Films | VERSUM MATERIALS US, LLC (US) | 2020-03-05 | — | — | US | claimed |
| US-20180033614-A1 | Compositions and Methods Using Same for Carbon Doped Silicon Containing Films | VERSUM MATERIALS US, LLC (US) | 2018-02-01 | — | — | US | claimed |