SCHEMBL661890

SCHEMBL661890

CO[Si](C)(CCCOCC1CO1)O[Si](C)(CCCOCC1CO1)OC

nearest known ligand 0.57

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.57
SMN1; SMN2 Q16637 1/20 0.55
ALDH1A1 P00352 4/20 0.51
TDP1 Q9NUW8 1/20 0.51
MAPK1 P28482 1/20 0.39
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28064 0.93 TSHR (0.61) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL18101818 0.93 TSHR (0.61) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL11019593 0.93 TSHR (0.61) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL18232240 0.92 TSHR (0.52) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
Phosphine SCHEMBL22165491 0.91 TSHR (0.59) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL21373926 0.91 TSHR (0.50) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL187760 0.90 TSHR (0.57) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL29223191 0.90 TSHR (0.57) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL26363951 0.89 TSHR (0.49) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL5605557 0.88 TSHR (0.64) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116004149-A Curable transparent resin composition and various articles derived therefrom 韩国太阳油墨股份公司 2023-04-25 CN claimed
US-20090252956-A1 DEW RESISTANT COATINGS AVERY DENNISON CORPORATION (US) 2009-10-08 US claimed
US-7504156-B2 Dew resistant coatings AVERY DENNISON CORPORATION (US) 2009-03-17 US claimed
US-20050233135-A1 Dew resistant coatings AVERY DENNISON CORPORATION 2005-10-20 US claimed
EP-4630510-A1 SEALANT COMPOSITIONS Henkel AG & Co. KGaA (DE) 2025-10-15 EP disclosed
US-20250313702-A1 SEALANT COMPOSITIONS HENKEL AG & CO KGAA (DE) 2025-10-09 US disclosed
WO-2025046304-A1 METHODS OF PRODUCING COATED OPTICAL SUBSTRATES FLO OPTICS LTD. (IL) 2025-03-06 WO disclosed
EP-3526306-B1 PHOTOCHROMIC ARTICLE SDC TECH INC (US) 2025-02-26 EP disclosed
WO-2024123480-A1 SEALANT COMPOSITIONS HENKEL AG & CO. KGAA (DE) 2024-06-13 WO disclosed
CN-110431213-B Photochromic articles SDC 科技有限公司 2023-05-09 CN disclosed
CN-116004149-A Curable transparent resin composition and various articles derived therefrom 韩国太阳油墨股份公司 2023-04-25 CN disclosed
US-11168223-B2 Photochromic article SDC TECHNOLOGIES, INC. (US) 2021-11-09 US disclosed
US-6348269-B1 TRANSPARENT COATINGS UPON CURING; HYDROLYSIS PRODUCTS AND PARTIAL CONDENSATES OF AN EPOXY FUNCTIONAL SILANE AND A DISILANE AND A CARBOXYLIC ACID COMPONENT SDC COATINGS, INC. 2002-02-19 US disclosed
US-6346331-B2 RADIATION TRANSPARENT SDC COATINGS, INC. 2002-02-12 US disclosed
US-6342097-B1 Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability SDC COATINGS, INC. 2002-01-29 US disclosed
US-20010056157-A1 Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability SDC TECHNOLOGIES, INC. 2001-12-27 US disclosed
US-20010049023-A1 COMPOSITION FOR PROVIDING AN ABRASION RESISTANT COATING ON A SUBSTRATE SDC TECHNOLOGIES, INC. 2001-12-06 US disclosed
US-6001163-A Composition for providing an abrasion resistant coating on a substrate SDC COATINGS, INC. (US) 1999-12-14 US disclosed
US-5958514-A Composition for providing an abrasion resistant coating on a substrate SDC COATINGS, INC. (US) 1999-09-28 US disclosed
EP-0855615-A2 Electrochromic device NIPPON OIL Co. Ltd. (JP) 1998-07-29 EP disclosed