SCHEMBL6669138

SCHEMBL6669138

CCCCCCCCCCCCCCCN(C)OC(C)=O.[NaH]

nearest known ligand 0.43

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 6/20 0.43
S1PR2 O95136 1/20 0.39
S1PR1 P21453 1/20 0.39
S1PR3 Q99500 1/20 0.39
S1PR5 Q9H228 1/20 0.39
ALDH1A1 P00352 1/20 0.39
CES2 O00748 4/20 0.38
KDM5A P29375 2/20 0.37
GGPS1 O95749 3/20 0.37
FAAH O00519 1/20 0.37
CES1 P23141 3/20 0.37
KDM4C Q9H3R0 1/20 0.37
PHF8 Q9UPP1 1/20 0.37
TSHR P16473 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11320198 0.98 DNM1 (0.44) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL4321071 0.98 DNM1 (0.44) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL30234581 0.98 DNM1 (0.44) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL11323157 0.98 DNM1 (0.44) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL11324407 0.98 DNM1 (0.44) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL8781867 0.96 ALDH1A1 (0.41) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL2750539 0.81 DNM1 (0.42) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL4891467 0.80 DNM1 (0.49) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL254321 0.80 DNM1 (0.44) DNM1S1PR2S1PR1S1PR3S1PR5
SCHEMBL11316939 0.79 ALDH1A1 (0.41) DNM1ALDH1A1CES2FAAHCES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1182512-B1 Method for preparing lithographic printing plate using alkaline liquid developer FUJIFILM CORP (JP) 2013-10-02 EP disclosed
EP-0903225-B1 Light sensitive composition and image forming material KONISHIROKU PHOTO IND (JP) 2004-09-22 EP disclosed
US-6051361-A PHOTOSENSITIVE MIXTURE COMPRISING A COMPOUND CAPABLE OF GENERATING AN ACID ON EXPOSURE OF ACTINIC LIGHT, A COMPOUND CAN BE CROSSLINKING BY AN ACID, AN INFRARED ABSORBER AND AN ADDITIONAL POLYMER KONICA CORPORATION (JP) 2000-04-18 US disclosed
EP-0762208-B1 Light sensitive composition KONISHIROKU PHOTO IND (JP) 2000-04-12 EP disclosed
EP-0903225-A2 Light sensitive composition and image forming material KONICA CORPORATION (JP) 1999-03-24 EP disclosed
US-5773194-A PHOTOSENSITIVITY; DURABILITY KONICA CORPORATION (JP) 1998-06-30 US disclosed
EP-0762208-A2 Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate KONICA CORPORATION (JP) 1997-03-12 EP disclosed
EP-0177962-B1 PHOTOSENSITIVE COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1993-04-07 EP disclosed
EP-0399755-A1 Light-sensitive composition and presensitized plate for use in making lithographic printing plates Fuji Photo Film Co., Ltd. (JP) 1990-11-28 EP disclosed
US-4731316-A DIAZO RESIN, OLEOPHILIC, HIGH MOLECULAR WEIGHT ACID MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1988-03-15 US disclosed
EP-0177962-A2 Photosensitive composition MITSUBISHI KASEI CORPORATION (JP) 1986-04-16 EP disclosed