Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6674761 | 0.89 | — | — | |
| SCHEMBL6673558 | 0.87 | — | — | |
| SCHEMBL6672941 | 0.86 | — | — | |
| SCHEMBL6672404 | 0.81 | SIGMAR1 (0.31) | — | |
| Hydrochloric Acid SCHEMBL8674390 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL8674387 | 0.79 | — | — | |
| SCHEMBL8584988 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL9168939 | 0.76 | SIGMAR1 (0.30) | — | |
| Hydrochloric Acid SCHEMBL9168946 | 0.76 | SIGMAR1 (0.30) | — | |
| SCHEMBL797547 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0963990-B1 | PROCESS FOR PRODUCING CYCLOPENTADIENYL METAL SALTS AND PROCESS FOR PRODUCING CYCLOPENTADIENE DERIVATIVES BY UTILIZING THE SAME | SUMITOMO CHEMICAL CO (JP) | 2004-10-06 | — | — | EP | disclosed |
| US-6197990-B1 | REACTING CYCLOPENTADIENE AND METAL HYDRIDE IN PRESENCE OF AMINE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-03-06 | — | — | US | disclosed |
| EP-0963990-A1 | PROCESS FOR PRODUCING CYCLOPENTADIENYL METAL SALTS AND PROCESS FOR PRODUCING CYCLOPENTADIENE DERIVATIVES BY UTILIZING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-12-15 | — | — | EP | disclosed |