Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC4 | P56524 | 1/20 | 0.30 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.30 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.30 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15135111 | 0.79 | — | — | |
| SCHEMBL634692 | 0.75 | HDAC4 (0.38) | HDAC4HDAC2HDAC8HDAC6 | |
| SCHEMBL153820 | 0.75 | HDAC4 (0.38) | HDAC4HDAC2HDAC8HDAC6 | |
| SCHEMBL11138198 | 0.75 | HDAC4 (0.38) | HDAC4HDAC2HDAC8HDAC6 | |
| SCHEMBL156064 | 0.72 | AKR1C3 (0.40) | HDAC4HDAC2HDAC8HDAC6 | |
| SCHEMBL7994473 | 0.72 | AKR1C3 (0.40) | HDAC4HDAC2HDAC8HDAC6 | |
| SCHEMBL155074 | 0.72 | AKR1C3 (0.40) | HDAC4HDAC2HDAC8HDAC6 | |
| SCHEMBL7994476 | 0.72 | AKR1C3 (0.40) | HDAC4HDAC2HDAC8HDAC6 | |
| SCHEMBL155075 | 0.72 | AKR1C3 (0.40) | HDAC4HDAC2HDAC8HDAC6 | |
| SCHEMBL8080804 | 0.72 | AKR1C3 (0.40) | HDAC4HDAC2HDAC8HDAC6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9329474-B2 | Photoresist composition and resist pattern-forming method | JSR CORPORATION (JP) | 2016-05-03 | — | — | US | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9120726-B2 | Radiation-sensitive resin composition, compound and producing method of compound | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-8968980-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20130280657-A1 | PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-10-24 | — | — | US | disclosed |
| US-8470513-B2 | Radiation-sensitive resin composition and polymer | JSR CORPORATION (JP) | 2013-06-25 | — | — | US | disclosed |
| US-8389202-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20120258399-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND PRODUCING METHOD OF COMPOUND | JSR CORPORATION (JP) | 2012-10-11 | — | — | US | disclosed |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120045719-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-02-23 | — | — | US | disclosed |
| US-7977442-B2 | Radiation-sensitive composition, polymer and monomer | JSR CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20100331440-A1 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER | JSR CORPORATION (JP) | 2010-12-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120045719-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | RFT1, RER1, ZYX | HDAC4 1287/4885HDAC2 997/4885HDAC8 1835/4885 |
| US-20100331440-A1 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER | ALG1, MRE11, PCNA | HDAC4 2938/4885HDAC2 1934/4885HDAC8 3404/4885 |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | RAD51, PYM1, MRE11 | HDAC4 2597/4885HDAC2 909/4885HDAC8 2858/4885 |
| US-20120258399-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND PRODUCING METHOD OF COMPOUND | RAD51, RER1, RXRA | HDAC4 1811/4885HDAC2 1247/4885HDAC8 1818/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.