Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 5/20 | 0.45 |
| ▸ | CYP2A6 | P11509 | 3/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | ACHE | P22303 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | DAO | P14920 | 1/20 | 0.30 |
| ▸ | DDO | Q99489 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11431683 | 0.77 | NQO1 (0.37) | CYP2A6ALDH1A1ACHEHPGDHSD17B10 | |
| SCHEMBL27639104 | 0.76 | CYP1A2 (0.52) | CYP1A2CYP2A6ALDH1A1HPGDHSD17B10 | |
| SCHEMBL9551471 | 0.75 | CYP1A2 (0.48) | CYP1A2CYP2A6ALDH1A1ACHEHPGD | |
| SCHEMBL2251040 | 0.72 | — | — | |
| SCHEMBL386156 | 0.71 | CYP1A2 (0.55) | CYP1A2CYP2A6ALDH1A1ACHEHPGD | |
| SCHEMBL5604271 | 0.71 | CYP1A2 (0.42) | CYP1A2CYP2A6ALDH1A1ACHECA1 | |
| SCHEMBL18317648 | 0.71 | CYP2A6 (0.44) | CYP1A2CYP2A6ALDH1A1HPGDHSD17B10 | |
| SCHEMBL18318769 | 0.71 | CYP2A6 (0.47) | CYP1A2CYP2A6ALDH1A1ACHEHPGD | |
| SCHEMBL9720823 | 0.70 | CYP2A6 (0.44) | CYP1A2CYP2A6ALDH1A1ACHEHPGD | |
| SCHEMBL458019 | 0.70 | CYP2A6 (0.44) | CYP1A2CYP2A6ALDH1A1ACHEHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 155 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| US-20190278175-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-09-12 | — | — | US | disclosed |
| US-20190025695-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-01-24 | — | — | US | disclosed |
| US-10082733-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2018-09-25 | — | — | US | disclosed |
| EP-2325695-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2017-12-20 | — | — | EP | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20030203309-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| EP-1008580-B1 | Process for preparing aldehydes and alcohols | MITSUBISHI CHEM CORP (JP) | 2003-02-26 | — | — | EP | disclosed |
| US-20020132181-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-09-19 | — | — | US | disclosed |
| EP-1225480-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-07-24 | — | — | EP | disclosed |
| EP-1008580-A1 | Process for preparing aldehydes and alcohols | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-06-14 | — | — | EP | disclosed |
| US-4202833-A | INTERMEDIATES TO BISPHENOL CARBONATES | THE UPJOHN COMPANY (US) | 1980-05-13 | — | — | US | disclosed |
| US-4200763-A | CHEMICAL INTERMEDIATE | THE UPJOHN COMPANY (US) | 1980-04-29 | — | — | US | disclosed |
| US-4164510-A | METAL PHTHALOCYANINE, TERT-ALKYL PEROXIDE AS CATALYST | THE UPJOHN COMPANY (US) | 1979-08-14 | — | — | US | disclosed |