Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trolamine SCHEMBL6455111 | 1.00 | MAPT (0.42) | MAPTALDH1A1LMNATDP1HPGD | |
| Trolamine SCHEMBL27756311 | 1.00 | MAPT (0.42) | MAPTALDH1A1LMNATDP1HPGD | |
| Trolamine SCHEMBL11507708 | 0.97 | MAPT (0.40) | MAPTALDH1A1LMNATDP1HPGD | |
| Trolamine SCHEMBL27571328 | 0.97 | MAPT (0.40) | MAPTALDH1A1LMNATDP1HPGD | |
| Trolamine SCHEMBL740171 | 0.97 | MAPT (0.40) | MAPTALDH1A1LMNATDP1HPGD | |
| Trolamine SCHEMBL27728576 | 0.97 | MAPT (0.40) | MAPTALDH1A1LMNATDP1HPGD | |
| Trolamine SCHEMBL8515537 | 0.93 | MAPT (0.42) | MAPTALDH1A1LMNATDP1HPGD | |
| Trolamine SCHEMBL8385039 | 0.88 | TDP1 (0.59) | MAPTALDH1A1LMNATDP1HPGD | |
| Trolamine SCHEMBL8769747 | 0.88 | MAPT (0.38) | MAPTTDP1HPGDMAPK1CYP1A2 | |
| Trolamine SCHEMBL29008328 | 0.86 | MAPT (0.39) | MAPTHPGDMAPK1CYP1A2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113631268-A | Catalyst and process for producing ethylenically unsaturated carboxylic acids or esters | 三菱化学英国有限公司 | 2021-11-09 | — | — | CN | claimed |
| EP-3033378-B1 | A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE | DOW GLOBAL TECHNOLOGIES LLC (US) | 2020-02-12 | — | — | EP | claimed |
| US-20160222164-A1 | Process to Produce Polycarbamate, Polycarbamate Produced Thereby and a Coating Composition Comprising the Polycarbamate | DOW GLOBAL TECHNOLOGIES LLC | 2016-08-04 | — | — | US | claimed |
| EP-3033378-A1 | A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE | Dow Global Technologies LLC (US) | 2016-06-22 | — | — | EP | claimed |
| WO-2015023906-A1 | A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE | DOW GLOBAL TECHNOLOGIES LLC (US) | 2015-02-19 | — | — | WO | claimed |
| CN-118541402-A | Method for preparing titanium modified Cr/silicon dioxide catalyst | 埃科维斯特催化剂技术有限责任公司 | 2024-08-23 | — | — | CN | disclosed |
| CN-115667404-B | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2024-05-03 | — | — | CN | disclosed |
| CN-117940516-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device | 富士胶片株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117881745-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and compound | 富士胶片株式会社 | 2024-04-12 | — | — | CN | disclosed |
| CN-117836715-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and alkali generator | 富士胶片株式会社 | 2024-04-05 | — | — | CN | disclosed |
| CN-117751326-A | Method for producing cured product, method for producing laminate, method for producing semiconductor device, resin composition, cured product, laminate, and semiconductor device | 富士胶片株式会社 | 2024-03-22 | — | — | CN | disclosed |
| CN-117730280-A | Method for producing cured product, method for producing laminate, method for producing semiconductor device, resin composition, cured product, laminate, and semiconductor device | 富士胶片株式会社 | 2024-03-19 | — | — | CN | disclosed |
| CN-103080849-A | Electrification member, process cartridge, and electrophotographic device | CANON KK | 2013-05-01 | — | — | CN | disclosed |
| EP-1029666-B1 | Waterless planographic printing plate precursor and production method thereof | FUJI PHOTO FILM CO LTD (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-6379803-B1 | LAMINATE GLASS CONTAINS SILICON AND TITANIUM OXIDES; VARIABLE REFRACTIVE INDICES; RADIATION TRANSPARENT, CLARITY; OPTICS, EYEGLASSES, CAMERAS | NIPPON SHEET GLASS CO., LTD. (JP) | 2002-04-30 | — | — | US | disclosed |
| US-6340526-B1 | LASER WRITING IS POSSIBLE, SCRATCH RESISTANCE AND SOLVENT RESISTANCE, IMAGE REPRODUCIBILITY | FUJI PHOTO FILM CO., LTD. (JP) | 2002-01-22 | — | — | US | disclosed |
| EP-1029666-A1 | Waterless planographic printing plate precursor and production method thereof | FUJI PHOTO FILM CO., LTD. (JP) | 2000-08-23 | — | — | EP | disclosed |
| EP-0953550-A1 | LOW-REFLECTANCE GLASS ARTICLE AND PROCESS FOR PREPARATING THE SAME | Nippon Sheet Glass Co., Ltd. (JP) | 1999-11-03 | — | — | EP | disclosed |
| EP-0941290-A1 | COATING COMPOSITIONS | International Coatings Limited (GB) | 1999-09-15 | — | — | EP | disclosed |
| WO-1998023691-A1 | COATING COMPOSITIONS | INTERNATIONAL COATINGS LIMITED (GB) | 1998-06-04 | — | — | WO | disclosed |