SCHEMBL6689352

SCHEMBL6689352

C=Cc1ccc(OC(OC2CCCCC2)C(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.35
ALDH1A1 P00352 2/20 0.33
KDM4E B2RXH2 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
ALDH1A3 P47895 1/20 0.33
NPSR1 Q6W5P4 2/20 0.32
TRPM8 Q7Z2W7 1/20 0.31
POLB P06746 1/20 0.31
MAPT P10636 1/20 0.31
SIRT2 Q8IXJ6 1/20 0.31
CHRNB2 P17787 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA7 P36544 1/20 0.31
CHRNA4 P43681 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21235014 1.00 HPGD (0.35) HPGDALDH1A1KDM4ESMN1; SMN2NPC1
SCHEMBL6694129 0.99 ALDH1A1 (0.34) HPGDALDH1A1KDM4ESMN1; SMN2NPC1
SCHEMBL2770233 0.87 L3MBTL1 (0.33) TRPM8
SCHEMBL685735 0.85 ALDH1A1 (0.35) HPGDALDH1A1KDM4ESMN1; SMN2NPC1
SCHEMBL5900974 0.84 ALDH1A1 (0.35) HPGDALDH1A1KDM4ESMN1; SMN2NPC1
SCHEMBL6694197 0.82 HPGD (0.34) HPGDALDH1A1KDM4EPOLBMAPT
SCHEMBL21235013 0.81 NPSR1 (0.44) HPGDALDH1A1KDM4ESMN1; SMN2NPC1
SCHEMBL6697869 0.80 HPGD (0.32) HPGDALDH1A1KDM4ECHRNB2CHRNB4
SCHEMBL6689734 0.79 SMN1; SMN2 (0.40) HPGDALDH1A1KDM4ESMN1; SMN2NPC1
SCHEMBL5900980 0.79 CHRNA7 (0.35) HPGDALDH1A1KDM4ESMN1; SMN2TRPM8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11640113-B2 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-05-02 US disclosed
US-11640113-B2 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-05-02 US disclosed
EP-3521926-B1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORP (JP) 2021-04-21 EP disclosed
US-20190219921-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-07-18 US disclosed
US-6770780-B1 QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS JSR CORPORATION (JP) 2004-08-03 US disclosed
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed