SCHEMBL6691192

SCHEMBL6691192

CCC(O)[N+](C)(C)C(C)O

nearest known ligand 0.42

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6832659 0.84 TSHR (0.41) TSHR
Water SCHEMBL2779683 0.81 TSHR (0.39) TSHR
SCHEMBL232452 0.73
SCHEMBL28376772 0.72 TSHR (0.32) TSHR
SCHEMBL28508269 0.72 TSHR (0.38) TSHR
SCHEMBL98071 0.71
SCHEMBL6834549 0.71 TSHR (0.41) TSHR
Hydrochloric Acid SCHEMBL29086616 0.70 TSHR (0.30) TSHR
Hydrochloric Acid SCHEMBL27605145 0.70 TSHR (0.36) TSHR
Bromide SCHEMBL3006377 0.70 ALDH1A1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040186206-A1 Polishing composition KAO CORPORATION (JP) 2004-09-23 US disclosed
WO-2004078410-A2 AGENT FOR INCREASING SELECTION RATIO OF POLISHING RATES KAO CORPORATION (JP) 2004-09-16 WO disclosed