Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6832659 | 0.97 | TSHR (0.41) | TSHR | |
| SCHEMBL6691192 | 0.81 | TSHR (0.42) | TSHR | |
| Water SCHEMBL319030 | 0.80 | — | — | |
| Water SCHEMBL2780526 | 0.80 | TSHR (0.39) | TSHR | |
| Water SCHEMBL16987408 | 0.78 | TSHR (0.37) | TSHR | |
| SCHEMBL28376772 | 0.77 | TSHR (0.32) | TSHR | |
| Water SCHEMBL2779346 | 0.76 | TSHR (0.41) | TSHR | |
| SCHEMBL98071 | 0.76 | — | — | |
| SCHEMBL6834549 | 0.76 | TSHR (0.41) | TSHR | |
| Hydrochloric Acid SCHEMBL29086616 | 0.75 | TSHR (0.30) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8568955-B2 | Composition for formation of top antireflective film, and pattern formation method using the composition | Electronic Materials USA Corp. (US) | 2013-10-29 | — | — | US | disclosed |
| EP-2233977-B1 | COMPOSITION FOR FORMATION OF TOP ANTIREFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION | AZ ELECTRONIC MATERIALS USA (US) | 2012-07-11 | — | — | EP | disclosed |
| US-20100286318-A1 | COMPOSITION FOR FORMATION OF TOP ANTIREFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION | MERCK PATENT GMBH (DE) | 2010-11-11 | — | — | US | disclosed |
| EP-2233977-A1 | COMPOSITION FOR FORMATION OF TOP ANTIREFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION | AZ Electronic Materials (Japan) K.K. (JP) | 2010-09-29 | — | — | EP | disclosed |