⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL49474 | 0.54 | — | — | |
| SCHEMBL1013364 | 0.54 | — | — | |
| Trimethylammonium SCHEMBL284438 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL5310222 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL13989274 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL5582 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL1331060 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL23064767 | 0.47 | — | — | |
| Trimethylammonium SCHEMBL5423733 | 0.47 | — | — | |
| Trimethylammonium SCHEMBL7279677 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 277 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120143333-A | Super-black nano coating structure | 深圳市原速光电科技有限公司 | 2025-06-13 | — | — | CN | claimed |
| CN-110350051-B | Nitrogen-containing compound crystalline silicon laminated tile double-sided solar cell and preparation method thereof | 通威太阳能（成都）有限公司 | 2024-12-06 | — | — | CN | claimed |
| CN-118231149-A | Solid aluminum electrolytic capacitor and preparation method and application thereof | 中国振华(集团)新云电子元器件有限责任公司(国营第四三二六厂) | 2024-06-21 | — | — | CN | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| US-11732351-B2 | Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films | VERSUM MATERIALS US, LLC (US) | 2023-08-22 | — | — | US | claimed |
| CN-116411261-A | Boron-containing compounds, compositions, and methods for depositing boron-containing films | 弗萨姆材料美国有限责任公司 | 2023-07-11 | — | — | CN | claimed |
| US-20210388489-A1 | Methods for Depositing a Conformal Metal or Metalloid Silicon Nitride Film and Resultant Films | VERSUM MATERIALS US, LLC (US) | 2021-12-16 | — | — | US | claimed |
| US-20200365401-A1 | Boron-Containing Compounds, Compositions, And Methods For The Deposition Of A Boron Containing Films | VERSUM MATERIALS US, LLC (US) | 2020-11-19 | — | — | US | claimed |
| EP-3663301-A1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | Versum Materials US, LLC (US) | 2020-06-10 | — | — | EP | claimed |
| US-20180274097-A1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM | VERSUM MATERIALS US, LLC | 2018-09-27 | — | — | US | claimed |
| US-20080254218-A1 | Metal Precursor Solutions For Chemical Vapor Deposition | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-16 | — | — | US | claimed |
| EP-1939323-A1 | Cyclic chemical vapor deposition of metal-silicon containing films | Air Products and Chemicals, Inc. (US) | 2008-07-02 | — | — | EP | claimed |
| US-20080145535-A1 | Cyclic Chemical Vapor Deposition of Metal-Silicon Containing Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-06-19 | — | — | US | claimed |
| US-20080041311-A1 | CHEMICAL DELIVERY APPARATUS FOR CVD OR ALD | APPLIED MATERIALS, INC. | 2008-02-21 | — | — | US | claimed |
| US-20070082500-A1 | Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides or oxynitrides | VERSUM MATERIALS US, LLC | 2007-04-12 | — | — | US | claimed |
| EP-1772460-A1 | Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides, oxides or oxynitrides | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-04-11 | — | — | EP | claimed |
| US-20060182885-A1 | Preparation of metal silicon nitride films via cyclic deposition | VERSUM MATERIALS US, LLC | 2006-08-17 | — | — | US | claimed |
| EP-1691400-A1 | Preparation of metal silicon nitride films via cyclic deposition | Air Products and Chemicals, Inc. (US) | 2006-08-16 | — | — | EP | claimed |
| EP-1451385-A1 | CYCLICAL DEPOSITION OF REFRACTORY METAL SILICON NITRIDE | Applied Materials, Inc. (US) | 2004-09-01 | — | — | EP | claimed |
| WO-2003050323-A1 | CYCLICAL DEPOSITION OF REFRACTORY METAL SILICON NITRIDE | APPLIED MATERIALS, INC. (US) | 2003-06-19 | — | — | WO | claimed |