SCHEMBL6691353

SCHEMBL6691353

C=C(C)c1ccc(OC(C)OCCCCCC)cc1

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.44
TSHR P16473 1/20 0.44
PLA2G4B P0C869 6/20 0.43
NR5A1 Q13285 1/20 0.41
RARB P10826 3/20 0.41
NPC1 O15118 1/20 0.41
LMNA P02545 1/20 0.41
GAA P10253 1/20 0.41
MAPT P10636 1/20 0.41
ALOX15 P16050 1/20 0.41
RAB9A P51151 1/20 0.41
HSD17B10 Q99714 1/20 0.41
PPARG P37231 3/20 0.40
PPARA Q07869 1/20 0.40
PLA2G4A P47712 1/20 0.40
SLC2A1 P11166 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6693121 0.98 TP53 (0.42) TP53TSHRPLA2G4BNR5A1RARB
SCHEMBL6694487 0.95 TSHR (0.37) TP53TSHRPLA2G4BNPC1LMNA
SCHEMBL6689051 0.89 KMT2A (0.35) MAPTPPARGPPARA
SCHEMBL6692463 0.86 TP53 (0.42) TP53TSHRPLA2G4BNR5A1RARB
SCHEMBL6699140 0.84 TP53 (0.43) TP53TSHRPLA2G4BNR5A1RARB
SCHEMBL6691005 0.84 TP53 (0.40) TP53TSHRPLA2G4BNR5A1RARB
SCHEMBL6689548 0.83 TP53 (0.42) TP53TSHRPLA2G4BNR5A1RARB
SCHEMBL6691376 0.83 TP53 (0.42) TP53TSHRPLA2G4BNR5A1RARB
SCHEMBL685750 0.83 KMT2A (0.37) LMNAMAPTPPARGPPARA
SCHEMBL6698189 0.82 TP53 (0.41) TP53TSHRPLA2G4BNR5A1RARB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed