Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.33 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.33 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.33 |
| ▸ | LTB4R | Q15722 | 2/20 | 0.32 |
| ▸ | LTB4R2 | Q9NPC1 | 2/20 | 0.32 |
| ▸ | DRD2 | P14416 | 1/20 | 0.32 |
| ▸ | DRD3 | P35462 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | PPARG | P37231 | 1/20 | 0.32 |
| ▸ | PPARA | Q07869 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6694487 | 0.87 | TSHR (0.37) | KMT2ALMNAMAPTSMN1; SMN2 | |
| SCHEMBL6689051 | 0.87 | KMT2A (0.35) | KMT2APARP10POLBNPSR1MAPT | |
| SCHEMBL10040369 | 0.86 | AKR1C3 (0.38) | LMNAPOLBNPSR1MAPTHPGD | |
| SCHEMBL685867 | 0.85 | KMT2A (0.36) | KMT2ALMNAPARP10POLBNPSR1 | |
| SCHEMBL6693121 | 0.84 | TP53 (0.42) | LMNAMAPTPPARGPPARA | |
| SCHEMBL6689016 | 0.83 | KMT2A (0.35) | KMT2APARP10POLBNPSR1MAPT | |
| SCHEMBL10204757 | 0.83 | KMT2A (0.35) | KMT2ALMNAPARP10NPSR1MAPT | |
| SCHEMBL3852488 | 0.83 | LMNA (0.52) | KMT2ALMNAPARP10POLBPPARA | |
| SCHEMBL6691353 | 0.83 | TP53 (0.44) | LMNAMAPTPPARGPPARA | |
| SCHEMBL810801 | 0.83 | MAPT (0.50) | KMT2ALMNAPARP10POLBNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 183 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | claimed |
| CN-118818897-A | Radiation-sensitive composition, cured film, method for producing same, semiconductor element, and display element | JSR株式会社 | 2024-10-22 | — | — | CN | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| EP-2485090-B1 | Radiation-sensitive resin composition for forming resist pattern | JSR CORP (JP) | 2020-12-23 | — | — | EP | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| US-20190278175-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-09-12 | — | — | US | disclosed |
| US-6743861-B1 | CONTROLLED STRUCTURE; NARROW DISPERSION; PARTIALLY PROTECTED HYDROXYL GROUP; BETTER RESOLUTION EXCIMER LASER RESIST MATERIAL | NIPPON SODA CO. LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| EP-0959389-B1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6713564-B1 | HAVING ALKENYLPHENOL SKELETONS; HIGH MOLECULAR WEIGHT; LOW VISCOSITY NARROW MOLECULAR WEIGHT RANGE; RESIST MATERIAL | NIPPON SODA CO. LTD. (JP) | 2004-03-30 | — | — | US | disclosed |
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | disclosed |
| EP-1211270-A1 | STAR BLOCK COPOLYMER | NIPPON SODA CO., LTD. (JP) | 2002-06-05 | — | — | EP | disclosed |
| EP-1211271-A1 | ALKENYLPHENOL COPOLYMER AND PROCESS FOR PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 2002-06-05 | — | — | EP | disclosed |
| US-6281318-B1 | REACTING 4-(1-METHYLETHENYL-)PHENYL WITH VINYL ETHER | MITSUI CHEMICALS, INC. (JP) | 2001-08-28 | — | — | US | disclosed |
| US-6235446-B1 | MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |