SCHEMBL6691452

SCHEMBL6691452

C=C(C)c1ccc(OCCCCCOC2CCCCC2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
GAA P10253 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.44
POLB P06746 1/20 0.43
APEX1 P27695 1/20 0.43
HTT P42858 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
KDM4E B2RXH2 1/20 0.43
CYSLTR2 Q9NS75 1/20 0.40
HPGD P15428 1/20 0.40
GPR119 Q8TDV5 1/20 0.40
PSMB1 P20618 1/20 0.40
PSMB5 P28074 1/20 0.40
PSMB2 P49721 1/20 0.40
PRMT1 Q99873 3/20 0.40
F2 P00734 2/20 0.40
ST14 Q9Y5Y6 2/20 0.40
PLAU P00749 1/20 0.40
PRMT5 O14744 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6694267 0.99 MEN1 (0.48) MEN1KMT2AGAAL3MBTL1POLB
SCHEMBL6689055 0.99 MEN1 (0.45) MEN1KMT2AGAAL3MBTL1POLB
SCHEMBL6694778 0.97 L3MBTL1 (0.46) MEN1KMT2AGAAL3MBTL1POLB
SCHEMBL6691345 0.96 KDM4E (0.43) MEN1KMT2AGAAL3MBTL1KDM4E
SCHEMBL6693620 0.94 KDM4E (0.44) MEN1KMT2AGAAL3MBTL1POLB
SCHEMBL7642094 0.84 NPC1 (0.40) MEN1KMT2AKDM4EHPGDPSMB1
SCHEMBL6689829 0.77 HPGD (0.50) MEN1KMT2AKDM4EHPGDMAOA
SCHEMBL5502709 0.76 TP53 (0.65) GAAL3MBTL1
SCHEMBL3001656 0.76 TP53 (0.65) GAAL3MBTL1
SCHEMBL3001402 0.76 TP53 (0.65) GAAL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed