SCHEMBL6694778

SCHEMBL6694778

C=C(C)c1ccc(OCCCCOC2CCCC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.46
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
GAA P10253 1/20 0.45
KDM4E B2RXH2 2/20 0.44
POLB P06746 1/20 0.42
APEX1 P27695 1/20 0.42
HTT P42858 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C19 P33261 1/20 0.39
CYSLTR2 Q9NS75 1/20 0.39
PRSS1 P07477 1/20 0.39
HPGD P15428 1/20 0.39
PSMB1 P20618 1/20 0.38
PSMB5 P28074 1/20 0.38
PSMB2 P49721 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6689055 0.99 MEN1 (0.45) L3MBTL1MEN1KMT2AGAAKDM4E
SCHEMBL6694267 0.99 MEN1 (0.48) L3MBTL1MEN1KMT2AGAAKDM4E
SCHEMBL6691452 0.97 MEN1 (0.47) L3MBTL1MEN1KMT2AGAAKDM4E
SCHEMBL6693620 0.97 KDM4E (0.44) L3MBTL1MEN1KMT2AGAAKDM4E
SCHEMBL6691345 0.96 KDM4E (0.43) L3MBTL1MEN1KMT2AGAAKDM4E
SCHEMBL7642094 0.84 NPC1 (0.40) MEN1KMT2AKDM4EHPGDPSMB1
SCHEMBL5033563 0.76 TP53 (0.62) L3MBTL1GAA
SCHEMBL6691117 0.76 HPGD (0.49) MEN1KMT2AKDM4ECYP1A2CYP2D6
SCHEMBL5033226 0.76 GAA (0.56) L3MBTL1MEN1KMT2AGAAHPGD
SCHEMBL6692138 0.75 HPGD (0.51) MEN1KMT2AKDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed