SCHEMBL6692471

SCHEMBL6692471

C=C(C)c1ccc(OC(CC)OCCC)cc1

nearest known ligand 0.33

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.33
PLK1 P53350 1/20 0.33
STS P08842 1/20 0.33
KDM4E B2RXH2 1/20 0.33
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PPARG P37231 2/20 0.32
PPARA Q07869 2/20 0.32
KMT2A Q03164 1/20 0.31
GAA P10253 2/20 0.30
RAB9A P51151 1/20 0.30
TP53 P04637 1/20 0.30
TSHR P16473 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6694149 0.94 TSHR (0.36) L3MBTL1STSSMN1; SMN2GAARAB9A
SCHEMBL6698189 0.91 TP53 (0.41) STSGAARAB9ATP53TSHR
SCHEMBL6699140 0.90 TP53 (0.43) STSGAARAB9ATP53TSHR
SCHEMBL6694156 0.89 TAS1R3 (0.33) L3MBTL1PLK1STSKDM4EHTT
SCHEMBL685869 0.87 KMT2A (0.33) PLK1PPARGPPARAKMT2AMAPT
SCHEMBL6692323 0.87 GAA (0.34) L3MBTL1STSPPARGPPARAGAA
SCHEMBL6691138 0.83 MAPT (0.37) SMN1; SMN2PPARGPPARAKMT2AMAPT
SCHEMBL6693689 0.83 GAA (0.36) L3MBTL1STSGAARAB9ATP53
SCHEMBL6693603 0.83 GAA (0.36) L3MBTL1STSGAARAB9ATP53
SCHEMBL6689051 0.83 KMT2A (0.35) L3MBTL1PLK1KDM4EHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed