SCHEMBL6693701

SCHEMBL6693701

C=C(C)c1ccc(OC(OC2CCCCC2)C(C)(C)C)cc1

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
NPC1 O15118 3/20 0.36
HPGD P15428 1/20 0.36
NPSR1 Q6W5P4 1/20 0.35
HTT P42858 3/20 0.33
STS P08842 3/20 0.32
LMNA P02545 2/20 0.31
MAPT P10636 2/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
PARP10 Q53GL7 1/20 0.31
CASP3 P42574 1/20 0.30
SENP8 Q96LD8 1/20 0.30
SENP7 Q9BQF6 1/20 0.30
SENP6 Q9GZR1 1/20 0.30
ADCY1 Q08828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6697933 0.99 SMN1; SMN2 (0.35) RAB9ASMN1; SMN2NPC1HPGDNPSR1
SCHEMBL6689734 0.82 SMN1; SMN2 (0.40) RAB9ASMN1; SMN2NPC1HPGDNPSR1
SCHEMBL686104 0.82 RAB9A (0.42) RAB9ASMN1; SMN2NPC1HPGDNPSR1
SCHEMBL6699705 0.81 SMN1; SMN2 (0.38) RAB9ASMN1; SMN2NPC1HPGDNPSR1
SCHEMBL6694449 0.80 SMN1; SMN2 (0.40) RAB9ASMN1; SMN2NPC1HPGDNPSR1
SCHEMBL6694197 0.80 HPGD (0.34) HPGDMAPT
SCHEMBL6691344 0.78 SMN1; SMN2 (0.36) RAB9ASMN1; SMN2NPC1HPGDNPSR1
SCHEMBL6697869 0.78 HPGD (0.32) HPGD
SCHEMBL6693617 0.77 SMN1; SMN2 (0.35) RAB9ASMN1; SMN2NPC1HPGDNPSR1
SCHEMBL6689050 0.76 SMN1; SMN2 (0.35) RAB9ASMN1; SMN2NPC1HPGDNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed